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Saibal Mukhopadhyay

Researcher at Georgia Institute of Technology

Publications -  432
Citations -  10232

Saibal Mukhopadhyay is an academic researcher from Georgia Institute of Technology. The author has contributed to research in topics: Computer science & CMOS. The author has an hindex of 40, co-authored 381 publications receiving 8814 citations. Previous affiliations of Saibal Mukhopadhyay include IBM & Purdue University.

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Proceedings ArticleDOI

3D Stacked High Throughput Pixel Parallel Image Sensor with Integrated ReRAM Based Neural Accelerator

TL;DR: This work presents a 3D stacked imaging system, composed of a digital pixel array, integrated with ReRAM based neural accelerator, and presents the system architecture and evaluates the various trade-offs in terms of hardware requirements, performance, and energy efficiency.
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Through-Oxide-Via-Induced Back-Gate Effect in 3-D Integrated FDSOI Devices

TL;DR: In this paper, the authors studied the interaction of the potential of through-oxide-via (TOV) and the electrical behavior of neighboring transistors in a 3D stack of fully depleted silicon-on-insulator (FDSOI) devices.
Proceedings ArticleDOI

Modeling of Ballistic Carbon Nanotube Field Effect Transistors for Efficient Circuit Simulation

TL;DR: In this paper, a method of circuit-compatible modeling of CNFETs in their ultimate performance limit is presented, which has been used to simulate arithmetic and logic blocks using HSPICE.
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Dual-Source-Line-Bias Scheme to Improve the Read Margin and Sensing Accuracy of STTRAM in Sub-90-nm Nodes

TL;DR: Simulations in predictive 65-nm nodes show that the proposed solution simultaneously reduce the sensing errors and improve the read margin, and a source-line biasing technique is proposed to satisfy the conflicting requirements of read margin and sensing accuracy.
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Estimation of gate-to-channel tunneling current in ultra-thin oxide sub-50nm double gate devices

TL;DR: This paper modeled (numerically and analytically) and analyzed gate-to-channel leakage in different DGFET structures, viz., doped body symmetric device with polysilicon gates, intrinsic body symmetry device with metal gates, and intrinsic body asymmetric device (AsymDG) with different front and back gate materials.