T
Toshio Kamiya
Researcher at Tokyo Institute of Technology
Publications - 394
Citations - 41346
Toshio Kamiya is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Amorphous solid & Thin film. The author has an hindex of 76, co-authored 383 publications receiving 38115 citations.
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Atomically-flat, chemically-stable, superconducting epitaxial thin film of iron-based superconductor, cobalt-doped BaFe2As2
Takayoshi Katase,Hidenori Hiramatsu,Hiroshi Yanagi,Toshio Kamiya,Masahiro Hirano,Hideo Hosono +5 more
TL;DR: The epitaxial growth of Fe-based superconductors such as Co-doped BaFe 2 As 2 (SrFe 2As 2 :Co) was reported recently, but has still insufficient properties for a device application because they are decomposed by reactions with water vapor in an ambient atmosphere as discussed by the authors.
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First-principles study of native point defects in crystalline indium gallium zinc oxide
TL;DR: In this article, the atomic arrangements and the electronic structures of crystalline InGaZnO4 containing point defects such as oxygen vacancy (VO), interstitial hydrogen (Hi), and interstitial oxygen (Oi) were investigated using a plane-wave pseudopotential method.
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Electronic Structures and Device Applications of Transparent Oxide Semiconductors: What Is the Real Merit of Oxide Semiconductors?
Toshio Kamiya,Hideo Hosono +1 more
TL;DR: In this paper, the main objective of this review is to provide an idea of how to create new functions in oxides and how to find suitable applications only oxides can realize.
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Conversion of an ultra-wide bandgap amorphous oxide insulator to a semiconductor
Junghwan Kim,Takumi Sekiya,Norihiko Miyokawa,Naoto Watanabe,Koji Kimoto,Keisuke Ide,Yoshitake Toda,Shigenori Ueda,Naoki Ohashi,Naoki Ohashi,Hidenori Hiramatsu,Hideo Hosono,Toshio Kamiya +12 more
TL;DR: Kim et al. as discussed by the authors showed that high partial pressures of oxygen gas during rapid laser deposition transforms amorphous gallium oxide films into semiconductors, achieving an electron Hall mobility of 8.5 cm2V−1.
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Diffusion-Limited a-IGZO/Pt Schottky Junction Fabricated at 200 $^{\circ}\hbox{C}$ on a Flexible Substrate
TL;DR: In this article, diffusion-limited Schottky junctions were fabricated at 200°C by employing a top amorphous In-Ga-Zn-O (a-IGZO)/bottom Pt electrode structure.