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Youdou Zheng

Researcher at Nanjing University

Publications -  557
Citations -  7057

Youdou Zheng is an academic researcher from Nanjing University. The author has contributed to research in topics: Chemical vapor deposition & Photoluminescence. The author has an hindex of 31, co-authored 493 publications receiving 5015 citations. Previous affiliations of Youdou Zheng include Xiamen University.

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Synthesis of ZnAl2O4/α-Al2O3 complex substrates and growth of GaN films

TL;DR: In this article, the solid phase reaction between pulsed-laser-deposited (PLD) ZnO film and α-Al2O3 substrate was synthesized, and X-ray diffraction (XRD) spectra showed that as the reaction proceeds, ZnAl 2O4 changes from the initial (111)-oriented single crystal to poly-crystal, and then to inadequate (111) orientation.
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On temperature dependence of the optically active behavior of an infrared active defect in silicon

TL;DR: In this article, the higher order bands of the infrared active defect were investigated at different temperatures in fast neutron irradiated silicon and it was found that the optically active decay follows logarithmic time dependence with a decay time of about 105 s, which is nearly temperature independent below 80 K. The residual absorption remains up to heating temperatures of 180 K.
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Synthesis and Growth Mechanism: A Novel Fishing Rod-Shaped GaN Nanorods

TL;DR: In this paper, a fishing rod-shaped GaN nanorod is successfully fabricated through a new method by using the two-step growth technology, which is applicable to continuous synthesis and is able to produce a large number of single-crystalline GaNnanorods with a relatively high purity and at a low cost.
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Over 10 kA/cm2 inductive current sustaining capability demonstrated in GaN-on-GaN pn junction with high ruggedness

TL;DR: Based on the doping profile design and edge electric field modulation in the pn junction, over 10 kA/cm2 current handling capability in both forward and reverse direction has been achieved as discussed by the authors .
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Epitaxial Lateral Overgrowth of GaN with Chloride-Based Growth Chemistries in Both Hydride and Metalorganic Vapor Phase Epitaxy

TL;DR: In this article, a planar lateral overgrowth (ELO) of GaN on SiO2-masked (0001) GaN substrates has been investigated by using chloride-based growth chemistries via hydride vapor phase epitaxy (HVPE) and metal organic vapor phase phase epitaxial (MOVPE), using Diethyl gallium chloride, (C2H5)2GaCl, as the MOVPE Ga precursor.