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Institution

Cree Inc.

CompanyShenzhen, China
About: Cree Inc. is a company organization based out in Shenzhen, China. It is known for research contribution in the topics: Layer (electronics) & Silicon carbide. The organization has 1014 authors who have published 2436 publications receiving 64884 citations.


Papers
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Patent
Primit Parikh1, Sten Heikman1
16 Nov 2007
TL;DR: In this article, a SiO2 dielectric layer is affixed to the support layer with a metal bonding layer using an Au-Sn utectic wafer bonding process, and the substrate is removed using reactive ion etching to expose the n+ layer, selected portions of the n+, n-, and barrier layers are removed to form a mesa diode structure on the dielectrics layer over the Schottky metal.
Abstract: A method of making a diode begins by depositing an AlxGa1-xN nucleation layer on a SiC substrate, then depositing an n+ GaN buffer layer (112), an n- GaN layer (110), an AlxGa1-xN barrier layer (108), and an SiO2 dielectric layer. A portion of the dielectric layer is removed and a Schottky metal (106) deposited in the void. The dielectric layer is affixed to the support layer with a metal bonding layer using an Au-Sn utectic wafer bonding process, the substrate is removed using reactive ion etching to expose the n+ layer, selected portions of the n+, n-, and barrier layers are removed to form a mesa diode structure on the dielectric layer over the Schottky metal (106); and an ohmic (114) contact is deposited on the n+ layer (112).

19 citations

Patent
09 Dec 2013
TL;DR: An optical waveguide assembly includes a plurality of separate body sections each having a coupling cavity for receiving an LED element and a light extraction feature spaced from the coupling cavity, and a mounting structure surrounding the plurality of body sections that maintains the plurality in assembled relationship as discussed by the authors.
Abstract: An optical waveguide assembly includes a plurality of separate body sections each having a coupling cavity for receiving an LED element and a light extraction feature spaced from the coupling cavity, and a mounting structure surrounding the plurality of body sections that maintains the plurality of body sections in assembled relationship. The waveguide assembly may be incorporated into a light engine.

19 citations

Patent
15 Sep 2010
TL;DR: In this article, the authors describe an enclosure adjacent at least one LED that is configured so that at least some light that is emitted by the at most one LED passes through the enclosure.
Abstract: LED lighting systems include an enclosure adjacent at least one LED that is configured so that at least some light that is emitted by the at least one LED passes through the enclosure. The enclosure also has a transmittance-to-reflectance ratio that is configured to homogenize light that emerges from the enclosure (1) directly from the at least one LED, and (2) after one or more reflections within the enclosure. LED lighting systems also include LEDs of at least two different colors, a reflective layer and a diffusion layer. The reflective layer has a transmittance-to-reflectance ratio that is configured to homogenize intensity of the light emitted from the LEDs. The diffusion layer is configured to homogenize color uniformity of the light.

19 citations

Patent
10 Aug 2009
TL;DR: In this paper, the authors proposed a hybrid reflector, which includes a transparent layer having an index of refraction lower than the silicon carbide substrate, and a reflective layer on the transparent layer opposite the substrate.
Abstract: Light emitting diodes include a silicon carbide substrate having first and second opposing faces, a diode region on the first face, anode and cathode contacts on the diode region opposite the silicon carbide substrate and a hybrid reflector on the silicon carbide substrate opposite the diode region. The hybrid reflector includes a transparent layer having an index of refraction that is lower than the silicon carbide substrate, and a reflective layer on the transparent layer, opposite the substrate. A die attach layer may be provided on the hybrid reflector, opposite the silicon carbide substrate. A barrier layer may be provided between the hybrid reflector and the die attach layer.

19 citations

Patent
05 Aug 2008
TL;DR: A semiconductor structure includes a Group III-nitride semiconductor layer, a protective layer on the semiconductor surface, a distribution of implanted dopants within semiconductor layers, and an ohmic contact extending through the protective layer to the semiconducting layer as discussed by the authors.
Abstract: A semiconductor structure includes a Group III-nitride semiconductor layer, a protective layer on the semiconductor layer, a distribution of implanted dopants within the semiconductor layer, and an ohmic contact extending through the protective layer to the semiconductor layer.

19 citations


Authors

Showing all 1018 results

NameH-indexPapersCitations
Steven P. DenBaars118136660343
Umesh K. Mishra9691242012
Umesh Mishra602139757
Joan M. Redwing5936112590
Bernd Keller5721412852
Peter Andrews5520610549
Gerald H. Negley512008756
Anant K. Agarwal503769752
Paul T. Fini461098309
John W. Palmour462028835
Yifeng Wu4612211227
Adam William Saxler441706634
John W. Palmour433016908
Sten Heikman431086399
Antony Paul Van de Ven411264586
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20231
20224
202111
202054
201950
201840