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Journal ArticleDOI

Band-gap changes and band offsets for ternary Si1−x−yGexCy alloys on Si(001)

H. Jörg Osten
- 10 Nov 1998 - 
- Vol. 84, Iss: 5, pp 2716-2721
TLDR
In this article, an estimation for the band offsets and the fundamental band gap was presented for Si1−x−yGexCy alloys tensile or compressive strained on Si(001).
Abstract
An estimation for the band offsets and the fundamental band gap will be presented for Si1−x−yGexCy alloys tensile or compressive strained on Si(001). This estimation considers both the band lineup at the interface of two different materials as well as the strain effects. Unknown material parameters have been adjusted to obtain the best agreement with experimental results for tensile strained Si1−yCy layers. The obtained results agree very well with the first experimental data for the effect of C on band-structure properties in Si1−x−yGexCy. For a completely strain-compensated (cubic) Si1−x−yGexCy layer, we predict significant “Ge effects” (smaller gap than Si, valence-band offset to Si) with values depending on the Ge content.

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Citations
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Journal ArticleDOI

SiGeC/Si superlattice microcoolers

TL;DR: SiGeC/Si superlattice microcoolers with dimensions as small as 40×40 µm^2 were fabricated and characterized in this article, where they were grown on Si substrates by molecular beam epitaxy and thermal conductivity was measured by the 3omega method.
Journal ArticleDOI

Fabrication technology of SiGe hetero-structures and their properties

TL;DR: In this article, the authors review the fabrication technology of SiGe hetero-structures aiming at growth of high quality materials and discuss the relaxation of strain of siGe buffer layers grown on Si substrates.
Journal ArticleDOI

Improvement in NiSi/Si contact properties with C-implantation

TL;DR: In this paper, the effects of C ion implantation into Si substrates on electrical properties of NiSi/Si(001) contacts were investigated, and it was shown that the increase in sheet resistance of a NiSi layers on Si was effectively suppressed by the C implantation, which is due to preventing the agglomeration of polycrystalline NiSi grains.
Journal ArticleDOI

Band offset predictions for strained group IV alloys: Si1-x-yGexCy on Si(001) and Si1-xGex on Si1-zGez(001)

TL;DR: In this paper, the authors investigated the relationship between the hydrostatic strain, the uniaxial strain and the intrinsic chemical effect of Ge and C on the band offsets of Si(001) substrate.
Journal ArticleDOI

Band alignment and conversion efficiency in Si/Ge type-II quantum dot intermediate band solar cells

TL;DR: In this paper, the effect of the type II band alignment in the quantum dot (QD) IB SCs on the above percentage is analyzed and the potential of the Ge/Si system for fabrication of type II QD IB SC is discussed.
References
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Journal ArticleDOI

Band lineups and deformation potentials in the model-solid theory.

TL;DR: In this paper, a theoretical model is presented to predict the band offsets at both lattice-matched and pseudomorphic strained-layer interfaces, based on the local density functional pseudopotential formalism and the ''model solid approach'' of Van de Walle and Martin.
Journal ArticleDOI

Theoretical calculations of heterojunction discontinuities in the Si/Ge system.

TL;DR: A theoretical study of the structural and electronic properties of pseudomorphic Si/Ge interfaces, in which the layers are strained such that the lattice spacing parallel to the interface is equal on both sides.
Journal ArticleDOI

Piezo-Electroreflectance in Ge, GaAs, and Si

TL;DR: In this article, piezoelectroreflectance in Ge, Si and GaAs was studied for uniaxial stress effects on electronic energy bands in three different energy bands.
Journal ArticleDOI

Optical band gap of the ternary semiconductor Si1−x−yGexCy

TL;DR: In this article, an indirect band gap Γv25' → Δc1 was found for the new semiconductor Si1−x−yGexCy over most compositions x and y.
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