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Journal ArticleDOI

Dielectric characterisation of semiconductors

Andrew K. Jonscher
- 01 Jun 1990 - 
- Vol. 33, Iss: 6, pp 737-742
TLDR
In this paper, the authors used dielectric spectroscopy of semiconductors (DSS) to characterize the energy depth of localised levels, the nature of the various transition rates and the interactions between the localised carriers and the lattice.
Abstract
The measurement of delayed electronic transitions in semiconductors by the technique of Dielectric Spectroscopy of Semiconductors (DSS) constitutes an effective means of characterising materials. The advantage of DSS in comparison with other static techniques consists in the availability of a large range of times or frequencies—typically several decades—which characterise the rate processes prevailing in the materials under study and thus reveal features which may not be accessible by more commonly used static techniques. The results give information about the energy depth of localised levels, about the nature of the various transition rates and also about the interactions between the localised carriers and the lattice, which are not easily measured by other techniques. They are relevant to the assessment of p−n junctions and also of the interfacial layers in Schottky barriers.

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Citations
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Journal ArticleDOI

On the corrosion mechanism of Mg investigated by electrochemical impedance spectroscopy

TL;DR: In this article, a detailed analysis of the electrochemical impedance spectra obtained for the Mg electrode during immersion in a sodium sulfate solution is presented, where various parameters are extracted such as the thin oxide film thickness, the resistivity at the metal/oxide film interface and at the oxide film/electrolyte interface, the active surface area as a function of the exposure time to the electrolyte, the thickness of the thick Mg(OH)2 layer and the kinetic constants of electrochemical reaction.
Journal ArticleDOI

Comparison of different methods for measuring the passive film thickness on metals

TL;DR: In this paper, in situ electrochemical impedance spectroscopy (EIS) and ex situ X-ray photoelectron spectroscopic (XPS) measurements were used to quantify the oxide film thickness and resistivity profiles through the oxide.
Journal ArticleDOI

Structure, ferroelectric/magnetoelectric properties and leakage current density of (Bi0.85Nd0.15)FeO3 thin films

TL;DR: In this paper, the authors report on the structure, ferroelectric/magnetoelectric properties and improvement of leakage current density of (Bi 0.85 Nd 0.15 )FeO 3 (BNFO) thin films deposited on Pt(1/Ti/SiO 2 /Si substrates from the polymeric precursor method.
Journal ArticleDOI

Dielectric spectroscopy analysis of CaCu3Ti4O12 polycrystalline systems

TL;DR: In this article, the effect of oxygen-rich atmosphere and high cooling rate was evaluated, revealing a strong increase in the dielectric properties of the CaCu 3 Ti 4 O 12 system under these conditions.
Journal ArticleDOI

Characterization of conduction in PZT thin films produced by laser ablation deposition

TL;DR: In this article, both direct current (d.c.) and alternating current (a.c). measurements were undertaken on lead zirconate titanate (PZT) films synthesized by laser ablation deposition.
References
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Book

Electronic processes in non-crystalline materials

TL;DR: The Fermi Glass and the Anderson Transition as discussed by the authorsermi glass and Anderson transition have been studied in the context of non-crystalline Semiconductors, such as tetrahedrally-bonded semiconductors.
Book

Dielectric relaxation in solids

TL;DR: In this paper, a broad-brush view of dielectric relaxation in solids is presented, making use of the existence of a universality of Dielectric response regardless of a wide diversity of materials and structures with dipolar as well as charge-carrier polarization.
Journal ArticleDOI

Deep‐level transient spectroscopy: A new method to characterize traps in semiconductors

TL;DR: Deep Level Transformer Spectroscopy (DLTS) as discussed by the authors is a high-frequency capacitance transient thermal scanning method useful for observing a wide variety of traps in semiconductors, which can display the spectrum of traps as positive and negative peaks on a flat baseline as a function of temperature.
Book

Semiconductor Statistics