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Journal ArticleDOI

Energetic condensation: Processes, properties, and products

John S. Colligon
- 01 May 1995 - 
- Vol. 13, Iss: 3, pp 1649-1657
TLDR
Energy assisted conditions for film growth are described in this paper, along with applications of the novel materials that can now be created on various substrates to improve friction, wear, corrosion resistance, and optical qualities.
Abstract
When film deposition is accompanied by bombardment by low energy (less than a few 100 eV) particles, the resulting film nucleation, growth, stress content, adhesion, density, composition, morphology, and crystal structure may be significantly altered. Current methods for providing the energy‐assisted conditions for film growth are described. Recent selected results are given demonstrating all the above features together with a discussion of the fundamental reasons for the improved film quality. Selected applications of the novel materials that can now be created on various substrates to improve friction, wear, corrosion resistance, and optical qualities are presented. The review concludes with an outline of future trends.

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Journal ArticleDOI

Magnetron sputtering: a review of recent developments and applications

TL;DR: Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings, such as hard, wear-resistant, low friction, corrosion resistant, and decorative coatings as discussed by the authors.
Journal ArticleDOI

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Book

Handbook of physical vapor deposition (PVD) processing

TL;DR: Physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing is discussed in this paper.
Journal ArticleDOI

A structure zone diagram including plasma-based deposition and ion etching

TL;DR: In this article, an extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering.
Journal ArticleDOI

High power impulse magnetron sputtering discharge

TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.
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