Journal ArticleDOI
Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
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TLDR
In this article, a four-layer SiO2-TiO2 antireflective coating on glass was fabricated using both plasma and ellipsometric control using both DC and MF sputtered films.About:
This article is published in Thin Solid Films.The article was published on 1999-08-30. It has received 53 citations till now. The article focuses on the topics: Ellipsometry & Sputter deposition.read more
Citations
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Journal ArticleDOI
TiO2 films prepared by DC magnetron sputtering from ceramic targets
Henryk Tomaszewski,Hilde Poelman,Diederik Depla,Dirk Poelman,Roger De Gryse,Lucien Fiermans,Marie-Françoise Reyniers,Geraldine Heynderickx,Guy Marin +8 more
TL;DR: In this paper, the deposition of stoichiometric TiO 2 films for V 2 O 5 /TiO 2 anatase catalysts was investigated. DC magnetron sputtering from ceramic oxide targets in an argon/oxygen atmosphere was chosen as deposition technique and the target behaviour upon sputtering was followed by means of the target voltage.
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Study of TiO2 film growth mechanisms in low-pressure plasma by in situ real-time spectroscopic ellipsometry
TL;DR: In this article, the initial stages of growth of TiO2 films prepared by plasma-enhanced chemical vapor deposition on plasma pre-oxidized c-Si were investigated using in situ real-time spectroscopic ellipsometry.
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Evaluation of photocatalytic properties of titanium oxide films prepared by plasma-enhanced chemical vapor deposition
TL;DR: In this paper, X-ray diffraction shows weak diffraction peaks of anatase even in the as-grown film, and their intensities increase after 600 °C annealing.
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Influence of Ar ion-beam assistance and annealing temperatures on properties of TiO2 thin films deposited by reactive DC magnetron sputtering
Sung-Hwa Kim,Chang Kwon Hwangbo +1 more
TL;DR: In this article, the effect of the Ar ion-beam current on the structural and optical properties of the reactive magnetron sputtered TiO2 thin films was studied, and the as-deposited films were subjected to annealing with the atmospheric environment.
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Preparation and optical properties of nanocrystalline thin films in the ZnO−TiO2 system
TL;DR: In this paper, the optical constants and the optical band gap were investigated using spectroscopic ellipsometry and optical absorption spectrum, and it was found that the optical bands gap obtained by these three methods are consistent with each other.
References
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Ion-based methods for optical thin film deposition
TL;DR: The optical properties of dielectric oxide films SiO2, Al2O3, TiO2 and ZrO2 produced by ion-based techniques have been reviewed in this paper.
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Microstructure modification of amorphous titanium oxide thin films during annealing treatment
TL;DR: In this paper, the influence of post-deposition annealing between 300 and 1100 °C on the structural and optical properties and surface morphology of titanium oxide has been investigated.
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Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
TL;DR: In this article, the optical, electrical and structural properties of the sputtered tin oxide and aluminum-doped zinc oxide films have been investigated by means of optical spectroscopy (UV-IR), X-ray diffraction.
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Structural and optical properties of sputtered Titania films
TL;DR: In this article, a detailed investigation has been made to study the influence of the combined effect of both deposition conditions (sputtering pressure and r.f. power) and post deposition annealing up to 600°C on the composition, structural and optical properties of the titanium oxide films.
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Optical and electrical properties of doped zinc oxide films prepared by ac reactive magnetron sputtering
B. Szyszka,S. Jäger +1 more
TL;DR: In this article, the optical, electrical and structural properties of the sputtered ZnO films were investigated by optical spectroscopy (UV-IR), X-ray diffraction, Hall-mobility and conductivity measurements.