Generation of extreme ultraviolet vortex beams using computer generated holograms.

TLDR: The presented method forms the basis for further studies on singular light fields in the EUV frequency range, i.e., in EUV interference lithography, and may also find applications in various fields of x ray optics.

Abstract: We fabricate computer generated holograms for the generation of phase singularities at extreme ultraviolet (EUV) wavelengths using electron beam lithography and demonstrate their ability to generate optical vortices in the nonzero diffraction orders. To this end, we observe the characteristic intensity distribution of the vortex beam and verify the helical phase structure interferometrically. The presented method forms the basis for further studies on singular light fields in the EUV frequency range, i.e., in EUV interference lithography. Since the method is purely achromatic, it may also find applications in various fields of x ray optics.