Journal ArticleDOI
Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks
TLDR
In this paper, phase-shifting masks and imaging characteristics are discussed and compared with those of conventional transmission masks and a halftone phase shifting mask is suggested for printing isolated patterns and it gives wider focus latitude than conventional mask technology.Abstract:
Phase-shifting masks and imaging characteristics are discussed and compared with those of conventional transmission masks. Then, new phase-shifting masks with intermediate values of phase shifting or transmittance are proposed, and their imaging characteristics are investigated. A phase-shifting mask with a 90° phase difference can ease the restrictions on pattern geometries used in phase-shifting technology but does not increase the focus latitude. It is also suggested that a halftone phase-shifting mask is suitable for printing isolated patterns and it gives wider focus latitude than conventional mask technology.read more
Citations
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Patent
Phase shifting circuit manufacture method and apparatus
Yao-Ting Wang,Yagyensh C. Pati +1 more
TL;DR: In this article, the phase shift mask and the single phase structure mask are derived from a set of masks used in a larger minimum dimension process technology and used for shrinking integrated circuit designs.
Journal ArticleDOI
Phase-shifting masks for microlithography: automated design and mask requirements
Y.C. Pati,Thomas Kailath +1 more
TL;DR: A computationally viable algorithm is proposed for the rapid design of phase-shifting masks for arbitrary two-dimensional patterns based on the use of a class of optimal coherent approximations to partially coherent imaging systems described by the Hopkins model.
Patent
Phase shift masking for complex patterns with proximity adjustments
TL;DR: In this paper, techniques for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features, are presented.
Patent
Standard cell design incorporating phase information
TL;DR: In this paper, the phase information is incorporated into a cell-based design methodology and phase sets are selected based on the ability to phase shift the features within the cell C by creating a phase set for most of the cells of a cell library.
Patent
Design data format and hierarchy management for processing
TL;DR: In this article, a phase shifting layout from an original layout is divided into useful groups, i.e., clusters that can be independently processed, so that the phase shifting process can be performed more rapidly.
References
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Journal ArticleDOI
A Novel Optical Lithography Technique Using the Phase-Shifter Fringe
Toshihiko Tanaka,Shou-ichi Uchino,Norio Hasegawa,Toshiaki Yamanaka,Tsuneo Terasawa,Shinji Okazaki +5 more
TL;DR: In this article, a new optical lithography technique called outline pattern transfer imaging (OPTIMA) is described, which utilizes an optical phase change at a clear phase-shifter pattern edge.