Patent
Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith
TLDR
In this article, a phase shift mask design capable of producing the chip design is presented, and phase termination of the phase regions is ensured based upon space constraints of a phase-shifted mask technique utilized.Abstract:
A process for creating and verifying a design of phase-shifted masks utilizing at least one phase shift region employing a computer-aided design system. A chip design is provided. A phase-shift mask design capable of producing the chip design is created. Features in a design of the phase-shifted mask that require phase shifting are located. Uncolored phase regions are created on opposite sides of the features. Proper phase termination of the phase regions is ensured based upon space constraints of a phase-shifted mask technique utilized. Phases are determined for the phase regions. Whether coloring errors and un-phase-shiftable design features exist is determined. Mask process specific overlaps and expansions are applied to the mask design to prepare designed data levels for mask manufacture. A residual phase edge image removal design is derived.read more
Citations
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Patent
Phase shift masking for complex patterns with proximity adjustments
TL;DR: In this paper, techniques for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features, are presented.
Patent
Standard cell design incorporating phase information
TL;DR: In this paper, the phase information is incorporated into a cell-based design methodology and phase sets are selected based on the ability to phase shift the features within the cell C by creating a phase set for most of the cells of a cell library.
Patent
Method for designing photolithographic reticle layout, reticle, and photolithographic process
Amy A. Winder,Werner Juengling +1 more
TL;DR: In this paper, the phase shift mask is created by storing a file representing a binary mask layout as one or more cells, or as a hierarchy of a plurality of cells, at least some of which cells contain printable shapes; for each cell, determining if the cell contains a printable shape, determining whether the cell will print desired features in a wafer fabrication process and if so, leaving the cell alone.
Patent
Design data format and hierarchy management for processing
TL;DR: In this article, a phase shifting layout from an original layout is divided into useful groups, i.e., clusters that can be independently processed, so that the phase shifting process can be performed more rapidly.
Patent
Design and layout of phase shifting photolithographic masks
TL;DR: In this article, a method for defining full phase layout for defining a layer of material in an integrated circuit is described, which can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting.
References
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Patent
Application generator for use in verifying a hierarchical circuit design
TL;DR: In this paper, a computer-based system and method for generating a design verification scheme for a hierarchical circuit design is described, where a set of directives are given describing design checks to be performed on a VLSI circuit design, functionally decomposed into primitive functions required to perform them.
Patent
Method of optical lithography using phase shift masking
TL;DR: In this article, the phase assignment for a phase shift mask is determined by a technique which determines, without assignment conflict, the intersection of the gate pattern with the active gate pattern and divides the intersection into categories of stacks where a slightly different phase assignment rules is employed for the different stacks.
Patent
Geometric autogeneration of "hard" phase-shift designs for VLSI
TL;DR: In this paper, a method implemented in a computer aided design (CAD) system automatically generates phase shifted mask designs for very large scale integrated (VLSI) chips from existing circuit design data.
Journal ArticleDOI
Computer aided design software for designing phase-shifting masks
TL;DR: In this article, a computer aided design software has been developed in order to improve the efficiency of completing the design of Levenson-type phase-shifting masks by assisting designers with the functions of automatic shifter arrangement and verification.