Pyrolysis of Negative Photoresists to Fabricate Carbon Structures for Microelectromechanical Systems and Electrochemical Applications
TLDR
In this paper, negative photoresists (SU-8 and photosensitive polyimide) were fabricated by the pyrolysis of a closed quartz tube furnace in a forming gas (95% N 2, 5% H 2 ).Abstract:
Carbon structures were fabricated by the pyrolysis of photopatterned negative photoresists (SU-8 and photosensitive polyimide) on silicon and fused silica wafers. Results here are compared with those of positive resists published earlier by this group. Negative resist films need exposure to ultraviolet light prior to pyrolysis to produce carbon films. The pyrolysis was carried out in a closed quartz tube furnace in a forming gas (95% N 2 , 5% H 2 ) atmosphere. The pyrolysis process was characterized using a combination of thermogravimetric analysis and differential thermal analysis. The pyrolysis of SU-8 involved gas evolution in a narower range of temperature than polyimide, The adhesion of the carbon film was found to depend on the resist, the substrate, and the heating cycle used. The carbon structures were characterized in terms of their shrinkage during the pyrolysis, the resistivity, the degree of crystallinity and the peak separation in cyclic voltammetry. Carbons derived from pyrolysis of negative resists showed higher resistivity, vertical shrinkage, and peak-to-peak separation voltage than positive resists. Transmission electron microscope results showed a distinct lack of crystallinity even after pyrolysis at 1100°C, unlike the positive resist derived carbon.read more
Citations
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Electrical Properties and Shrinkage of Carbonized Photoresist Films and the Implications for Carbon Microelectromechanical Systems Devices in Conductive Media
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References
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Malay K. Ghosh,K. L. Mittal +1 more
TL;DR: The history of the development of polyimides can be found in this article, where the authors describe the development and development of the Polyimides, the synthesis and synthesis of polyamideimides and their application in high-performance electronics Packaging and Optoelectronic Applications.
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TL;DR: In this article, the authors present an overview of the basic concepts for Numerical Simulation of Contaminant Transport and Biodegradation. But they do not discuss the application of the simulation in the real world.
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SU-8: a low-cost negative resist for MEMS
TL;DR: In this paper, the characterization of a home-made negative photoresist developed by IBM is described, called SU-8, which can be produced with commercially available materials and has an outstanding aspect ratio near 15 for lines and 10 for trenches, combined with the electroplating of copper allow the fabrication of highly integrated electromagnetic coils.