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Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase Epitaxy

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TLDR
In this article, GaN layers with a dislocation density as low as 6×107 cm-2 were grown on 2-inch-diameter sapphire wafers.
Abstract
Thick GaN layers were grown by hydride vapor phase epitaxy (HVPE) with the aim of using these layers as a homoepitaxial substrate to improve device quality of laser diodes or light emitting diodes. HVPE is very useful for thick layer growth since the growth rate can reach from several ten up to one hundred micron per hour. In this experiment, the growth began as selective growth through openings formed in a SiO2 mask. Facets consisting of {1101} planes were formed in the early stage and a continuous film developed from the coalescence of these facets on the SiO2 mask. As a result, GaN layers with a dislocation density as low as 6×107 cm-2 were grown on 2-inch-diameter sapphire wafers. These GaN layers were crack-free and had mirror-like surface.

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Gan : processing, defects, and devices

TL;DR: The role of extended and point defects, and key impurities such as C, O, and H, on the electrical and optical properties of GaN is reviewed in this article, along with the influence of process-induced or grown-in defects and impurities on the device physics.
Journal ArticleDOI

InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate

TL;DR: In this paper, a GaN multi-quantum well-structure laser diodes with Al0.14Ga0.86N/GaN modulation doped strained-layer superlattice cladding layers grown on an epitaxially laterally overgrown GaN (ELOG) substrate was demonstrated to have a lifetime of more than 1150 h under room-temperature continuous-wave operation.
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Theoretical Study of Orientation Dependence of Piezoelectric Effects in Wurtzite Strained GaInN/GaN Heterostructures and Quantum Wells

TL;DR: In this article, the crystal orientation dependence of piezoelectric fields in wurtzite strained Ga0.9In0.1N/GaN heterostructures was analyzed.
Journal ArticleDOI

White light-emitting diodes: History, progress, and future

TL;DR: The history of white light-emitting diodes (LEDs) can be found in this paper, where the authors review the history of the conception, improvement, and commercialization of the white LED.
Journal ArticleDOI

Defect structure in selectively grown GaN films with low threading dislocation density

TL;DR: In this article, defect structures in GaN films grown selectively in hydride vapor-phase epitaxy (HVPE) were characterized by transmission electron microscopy (TEM) defect structures.
References
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Journal ArticleDOI

Shortest wavelength semiconductor laser diode

TL;DR: A group III nitride based separate confinement heterostructure (SCH) single quantum well (SQW) structure, with an active layer thickness as small as 1.5 nm, was fabricated in this paper.
Journal ArticleDOI

Relaxation mechanism of thermal stresses in the heterostructure of GaN grown on sapphire by vapor phase epitaxy

TL;DR: In this paper, the authors studied the thermal strains and stresses due to the thermal expansion coefficient difference in GaN(0001)/α-Al2O3(0001) layered structures.
Journal ArticleDOI

Electronic and structural properties of GaN grown by hydride vapor phase epitaxy

TL;DR: In this paper, the electronic and structural properties of GaN were investigated for heteroepitaxial layers grown by hydride vapor phase epitaxy, and the films exhibited bound exciton photoluminescence lines with a full width at half-maximum (FWHM) of 2.42 meV at 2 K.
Journal ArticleDOI

Photopumped Stimulated Emission from Homoepitaxial GaN Grown on Bulk GaN Prepared by Sublimation Method

TL;DR: In this paper, a photopumped homoepitaxial GaN was shown to produce stimulated emission at room temperature from a homo-epitaxis layer on a small hexagonal bulk GaN prepared by sublimation.
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