Journal ArticleDOI
Third-generation plasma immersion ion implanter for biomedical materials and research
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TLDR
A third generation plasma immersion ion implanter dedicated to biomedical materials and research has been designed and constructed as mentioned in this paper, which consists of four sets of high-efficiency metal arc plasma sources with magnetic filters, a custom designed high voltage modulator for operation up to 60 kV, a separate high-frequency, lowvoltage power supply for hybrid treatment processes, a special rotating sample stage for samples with an irregular shape, and other advanced features.Abstract:
A third generation plasma immersion ion implanter dedicated to biomedical materials and research has been designed and constructed. The distinct improvement over first and second generation multipurpose plasma immersion ion implantation equipment is that hybrid and combination techniques utilizing metal and gas plasmas, sputter deposition, and ion beam enhanced deposition can be effectively conducted in the same machine. The machine consists of four sets of high-efficiency metal arc plasma sources with magnetic filters, a custom designed high voltage modulator for operation up to 60 kV, a separate high-frequency, low-voltage power supply for hybrid treatment processes, special rotating sample stage for samples with an irregular shape, and other advanced features. The machine has been installed at Southwest Jiaotong University and operated reliably for 6 months. This article describes the design principles and performances of the machine as well as pertinent biomedical applications.read more
Citations
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A review of modified DLC coatings for biological applications
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Stimulation of bone growth following zinc incorporation into biomaterials.
Yuqin Qiao,Wenjie Zhang,Peng Tian,Fanhao Meng,Hongqin Zhu,Xinquan Jiang,Xuanyong Liu,Paul K. Chu +7 more
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Plasma surface modification of poly vinyl chloride for improvement of antibacterial properties.
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Plasma-treated nanostructured TiO2 surface supporting biomimetic growth of apatite
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References
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Characterization of diamond films by Raman spectroscopy
Diane S. Knight,William B. White +1 more
TL;DR: The Raman spectrum of hexagonal diamond (lonsdaleite) is distinct from that of the cubic diamond and allows it to be recognized as discussed by the authors, and the Raman line width varies with mode of preparation of the diamond and has been related to degree of structural order.
Journal ArticleDOI
Plasma source ion-implantation technique for surface modification of materials
TL;DR: Plasma source ion implantation (PSII) as discussed by the authors is a new ion-implantation technique which has been optimized for surface modification of materials such as metals, plastics, and ceramics.
Journal ArticleDOI
Use of Raman scattering to investigate disorder and crystallite formation in as-deposited and annealed carbon films
TL;DR: In this article, the Raman spectra of carbon films were analyzed via a best fit to computer-generated line shapes, used to simulate the $D$ and $G$ lines.
Book
Handbook of plasma immersion ion implantation and deposition
TL;DR: This work presents a meta-analysis of Plasma Immersion Ion Implantation and Thin-Film Deposition, and its applications in Nonsemiconductor Applications of PIII&D and Materials Characterization and Testing Methods.
Journal ArticleDOI
Plasma immersion ion implantation—a fledgling technique for semiconductor processing
TL;DR: Plasma immersion ion implantation (PIII) is a cluster compatible doping and processing tool offering many inherent advantages over conventional beamline ion implantations as discussed by the authors, such as the formation of shallow junction, synthesis of silicon-on-insulator, large area implantation, trench doping, conformal deposition and so on.