Journal ArticleDOI
X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes
Gilbère J. A. Mannie,Gijsbert Gerritsen,Hendrikus C. L. Abbenhuis,J. van Deelen,J.W. Niemantsverdriet,Peter C. Thüne +5 more
TLDR
In this paper, the authors investigated the reaction mechanism of monobutyl tinchloride (MBTC) and water during SnO2 thin film growth using x-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM).Abstract:
The chemistry of atmospheric pressure chemical vapor deposition (APCVD) processes is believed to be complex, and detailed reports on reaction mechanisms are scarce. Here, the authors investigated the reaction mechanism of monobutyl tinchloride (MBTC) and water during SnO2 thin film growth using x-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). XPS results indicate an acid-base hydrolysis reaction mechanism, which is tested with multilayer experiments, demonstrating self-terminating growth. In-house developed TEM wafers are used to visualize nucleation during these multilayer experiments, and results are compared with TEM results of APCVD samples. Results show almost identical nucleation behavior implying that their growth mechanism is identical. Our experiments suggest that in APCVD, when using MBTC and water, SnO2 film growth occurs via a heterolytic bond splitting of the Sn-Cl bonds without the need to invoke gas-phase radical or coordination chemistry of the MBTC precursor. © 2013 American Vacuum Society.read more
Citations
More filters
Journal ArticleDOI
Fabrication of 3D Core–Shell Multiwalled Carbon Nanotube@RuO2 Lithium-Ion Battery Electrodes through a RuO2 Atomic Layer Deposition Process
Keith Gregorczyk,Alexander C. Kozen,Xinyi Chen,Marshall A. Schroeder,Malachi Noked,Anyuan Cao,Liangbing Hu,Gary W. Rubloff +7 more
TL;DR: A fully characterized atomic layer deposition process for RuO2, electrochemical cycling data for ALD RuO1, and the application of theRuO2 to a composite carbon nanotube electrode scaffold with nucleation-controlled RuO 2 growth are reported.
Journal ArticleDOI
Effect of annealing on chemical, structural and electrical properties of Au/Gd2O3/n-GaN heterostructure with a high-k rare-earth oxide interlayer
TL;DR: In this paper, the chemical, structural and electrical characteristics of a fabricated Au/Gd2O3/n-GaN heterostructure with gadolinium oxide (GdO3) as an insulating layer are explored by XPS, XRD and I-V techniques at room temperature and 400°C annealing.
Journal ArticleDOI
Nano- and micro-tribological behaviours of plasma nitrided Ti6Al4V alloys.
Aniruddha Samanta,Manjima Bhattacharya,Itishree Ratha,Himel Chakraborty,S. K. Datta,Jiten Ghosh,Sandip Bysakh,Monjoy Sreemany,R. Rane,Alphonsa Joseph,Subroto Mukherjee,Biswanath Kundu,Mitun Das,Anoop Kumar Mukhopadhyay +13 more
TL;DR: The experimental results confirmed that the nanohardness, Young's modulus, micro scratch wear resistance, nanowear resistance, sliding wear resistance of the TAPN samples were much better than those of the TA samples.
Journal ArticleDOI
Selection of micro-fabrication techniques on stainless steel sheet for skin friction
Sheng Zhang,Xiangqiong Zeng,Xiangqiong Zeng,David Thomas Allan Matthews,Amaya Igartua,E. Rodriguez-Vidal,J. Contreras Fortes,V. Saenz de Viteri,F. Pagano,Boel Wadman,E. D. Wiklund,E. van der Heide +11 more
TL;DR: The state-of-the-art techniques used for surface texturing, e.g., wet etching, plasma etchings, laser surface textured (LST), 3D printing, etc., are reviewed in this paper.
Journal ArticleDOI
Microstructure and mechanical property of TiSiN nanocomposite film with inserted CrAlN nanomultilayers
TL;DR: In this paper, a series of TiSiN films inserted by CrAlN nanomultilayers with different thicknesses was prepared by reactive magnetron sputtering, and the influences of CrAln layer thickness on the microstructure and hardness of films were investigated by X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM) and nano-indentation techniques.
References
More filters
Journal ArticleDOI
The surface and materials science of tin oxide
Matthias Batzill,Ulrike Diebold +1 more
TL;DR: A review of surface science studies of single crystal surfaces, but selected studies on powder and polycrystalline films are also incorporated in order to provide connecting points between surface sciences studies with the broader field of materials science of tin oxide as discussed by the authors.
Journal ArticleDOI
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
TL;DR: In this paper, the surface chemistry of the trimethylaluminum/water ALD process is reviewed, with an aim to combine the information obtained in different types of investigations, such as growth experiments on flat substrates and reaction chemistry investigation on high-surface-area materials.
Journal ArticleDOI
Silsesquioxanes as models for silica surfaces
TL;DR: In this article, a single-crystal X-ray diffraction study of trisilanol 1 and 3b has been carried out, showing structural similarities with trifunctional monomers.
Journal ArticleDOI
On silsesquioxanes’ accuracy as molecular models for silica-grafted complexes in heterogeneous catalysis
TL;DR: In this paper, the use of silsesquioxanes (POSS) organometallic complexes as molecular models for silica-grafted catalytic centers has been studied.
Related Papers (5)
Metal—organic chemical vapor deposition of copper using hydrated copper formate as a new precursor
Physical and spectroscopic studies of the nucleation and growth of copper thin films on polyimide surfaces by chemical vapor deposition
Noo Li Jeon,Ralph G. Nuzzo +1 more