Journal ArticleDOI
X‐ray zone plates fabricated using electron beam lithography and reactive ion etching
H. Aritome,H. Aoki,S. Namba +2 more
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TLDR
In this article, a new fabrication method for zone plates using electron beam lithography and reactive ion etching is described, which is possible to obtain a high resolution zone plate with a large aspect ratio.Abstract:
A Fresnel zone plate, a focusing element that operates using diffraction, is a promising candidate for x‐ray optical elements since the index of refraction of all materials in this region is slightly less than unity. In this report, a new fabrication method for zone plates using electron beam lithography and reactive ion etching is described. By this method, it is possible to obtain a high resolution zone plate with a large aspect ratio. Focusing characteristics of fabricated zone plates are measured by synchrotron radiation. At the wavelength of 9 nm, the spot size of 2 μm is obtained at the focal point of 100 mm.read more
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Journal ArticleDOI
Formation and Characterization of Self-assembled Monolayers of Octadecyltrimethoxysilane on Chromium: Application in Low-Energy Electron Lithography
TL;DR: In this paper, an organosilane self-assembled monolayer (Octadecyltrimethoxysilane: OTMS) on chromium oxide was investigated by X-ray photoelectron (XPS) spectroscopy and water contact angle measurements.
Journal ArticleDOI
X‐ray determination of dislocation density in epitaxial ZnCdTe
Syed B. Qadri,John H. Dinan +1 more
TL;DR: In this article, widths of doublecrystal x-ray rocking curves for epitaxial layers of the ternary alloy ZnCdTe were found to correlate with lattice parameter misfit between layer and substrate.
Journal ArticleDOI
Zone plate lenses for X-ray microscopy
Y. Vladimirsky,Dieter P. Kern,T.H.P. Chang,David Attwood,N. Iskander,Stephen S. Rothman,K. McQuaide,Janos Kirz,Harald Ade,Ian McNulty,Harvey Rarback,D. Shu +11 more
TL;DR: Fresnel zone plate lenses with feature sizes as small as 50 nm have been constructed and used in the Stony Brook/NSLS scanning X-ray microscope with 3.1 nm radiation from Brookhaven's X-17 mini-undulator as discussed by the authors.
Journal ArticleDOI
Materials for multilayer zone plates: development of a focusing element for use in SR photo-excited processes
TL;DR: A multilayer zone plate (ZP) fabricated by a sputtered-sliced technique is expected to be a hopeful optical element to form a hard X-ray microbeam as discussed by the authors.
Proceedings ArticleDOI
Electron beam lithography and nanometer structures-fabrication of microzone plates
V. Bogli,P. Unger,H. Beneking +2 more
TL;DR: In this article, a step by step improvement of fabricated microzone plates with an outermost zone width of 50 nm has been shown, where a thin titanium intermediate layer is used as a stable mask to generate ion milled gold absorber rings with very steep walls.