Showing papers on "Ion beam deposition published in 1973"
TL;DR: The generation of high-current pulsed ion beams with ion energy in the range 0.5-10 MeV appears to be possible by modifications of present electron-beam technology as mentioned in this paper.
Abstract: The generation of high-current (\ensuremath{\sim}${10}^{5}$ A) pulsed ion beams with ion energy in the range 0.5-10 MeV appears to be possible by modifications of present electron-beam technology.
110 citations
98 citations
TL;DR: A review of dominant mechanisms in ion plating is made in this paper, where the effects of chamber pressure, electrical bias arrangements, and the introduction of a coevaporant source are discussed with regard to deposition rate, ultimate film quality, and throwing power of the system.
Abstract: A review of some dominant mechanisms in ion plating is made. Factors influencing throwing power and film quality are discussed and the damaging effects of a high ambient gas background are considered with a view toward minimizing the harmful effects of contaminant gas background. The physical mechanisms involved in an ion beam deposition process [S. Aisenberg and R. Chabot, J. Appl. Phys. 42, 2953 (1972)] are examined. The effects of chamber pressure, electrical bias arrangements, and the introduction of a coevaporant source are discussed with regard to deposition rate, ultimate film quality, and throwing power of the system.
96 citations
TL;DR: In this paper, both adsorbed reacted surface oxygen (surface oxide) and the dynamic implantation range of primary oxygen ions have been shown to influence secondary ion yields and complicate the interpretation of secondary ion mass spectrometry (SIMS) in-depth analysis within the first few hundred angstroms of the surface.
Abstract: Both adsorbed reacted surface oxygen (surface oxide) and the dynamic implantation range of primary oxygen ions have been shown to influence secondary ion yields and complicate the interpretation of secondary ion mass spectrometry (SIMS) in‐depth analysis within the first few hundred angstroms of the surface. Surface oxide chemically enhances the secondary ion yield over the first few tens of angstroms. After removal of the surface oxide, the secondary ion emission yield reaches a minimum level, and enhancement of the secondary ion yield is then a function of the distribution of the implanted oxygen concentration. These effects have been studied on arsenic‐implant‐diffused and unimplanted single‐crystal silicon.
50 citations
TL;DR: In this article, an improved form of a new type of electrostatic ion gun, which is suitable for ion etching and ion thinning, is described, and it is shown that the device has three main modes of operation, namely an ''oscillating mode', a ''transition mode'' and a ''general glow discharge mode''.
Abstract: An improved form of a new type of electrostatic ion gun, which is suitable for ion etching and ion thinning, is described. It is shown that the device has three main modes of operation, namely an `oscillating mode', a `transition mode' and a `general glow discharge mode'. An explanation of these modes, together with the intensity and profile of the emerging ion beam obtained in each case, is given. It is suggested that advantage can be taken of these effects in specific applications.
23 citations
23 citations
Patent•
IBM1
TL;DR: In this paper, a high brightness ion beam is obtained by using lasers to excite atoms or molecules from the ground state to an ionized state in increments, rather than in one step.
Abstract: A high brightness ion beam is obtainable by using lasers to excite atoms or molecules from the ground state to an ionized state in increments, rather than in one step. The spectroscopic resonances of the atom or molecule are used so that relatively long wavelength, low power lasers can be used to obtain such ion beam.
21 citations
Patent•
17 Dec 1973
TL;DR: In this paper, the secondary ion spectrum is analyzed with a mass filter and display unit to provide a spectral distribution of the species in the specimen to which the mass filter is tuned.
Abstract: A method and apparatus employing ion and electron beams for chemically analyzing a specimen. A specimen is mounted on a movable platform in an evacuated chamber and irradiated with an ion beam over a predetermined area of interest to liberate secondary ions. The secondary ion spectrum is analyzed with a mass filter and display unit to provide a spectral distribution. Ions having a particular mass-to-charge ratio are selected for spatial distribution analysis and the mass filter is tuned to the selected mass-to-charge ratio. The filtered beam of secondary ions passed through the mass filter is detected by an ion detector which generates a signal representative of secondary ion abundance at that mass-to-charge ratio. The ion detector output signals are used to control the intensity or deflection of a CRT beam. An independently generated electron beam is scanned over the specimen area irradiated by the ion beam and the CRT beam is swept in synchronism with the scanned electron beam. The electron beam, scanned over the ion irradiated specimen area, modulates the secondary ion yield at the point where both the electron beam and the ion beam are coincident on the specimen. The resulting display is a two dimensional spatial distribution map of the species in the specimen to which the mass filter is tuned.
21 citations
TL;DR: In this paper, the authors discuss the production of secondary ions, the various types of instrumentation used, and applications of the ion probe technique, and the application of secondary ion images.
20 citations
TL;DR: In this paper, the authors investigated in situ argon ion bombardment of specimens in the field of ion microscope, both from the point of view of the efficiency of the cleaning process and the investigation of ensuing surface and lattice damage, a task to which the technique of field ion microscopy is particularly appropriate.
TL;DR: In this article, an ion beam probing technique was developed to measure the electron temperature in a magnetically confined plasma, involving the use of two akali metal ion beams, provided accurate measurements of electron temperatures below 100 eV.
Abstract: An ion beam probing technique has been developed to measure the electron temperature in a magnetically confined plasma. The technique, involving the use of two akali metal ion beams, provides accurate measurements of electron temperatures below 100 eV.
TL;DR: In this paper, an ion gun for producing beams of Li + ions has been constructed and its basic characteristics have been investigated, and the operation of the ion source is based on the effect of the thermoionic emission of Li+ ions from beta-eucryptite (Li 2 O·Al 2 O 3 ·2SiO 2 ).
TL;DR: In this paper, the probability of the collision of an ion with neutral gas atoms is derived from the decay length of the ion-beam intensity by an injection of a beam into a weakly ionized plasma.
Abstract: The probability of the collision of an ion with neutral‐gas atoms is obtained from the decay length of the ion‐beam intensity by an injection of an ion beam into a weakly ionized plasma. The damping of the ion‐beam intensity is compared with the collisional damping of an ion acoustic wave.
TL;DR: In this article, an effect of radiation-enhanced diffusion during boron ion implantation into 200 to 500 deg C germanium substrates was found, independent of the temperature.
Abstract: An effect of radiation-enhanced diffusion during boron ion implantation into 200 to 500 deg C germanium substrates was found. The boron-enhanced diffusion coefficient is independent of the temperature over the range 200 to 500 deg C during ion implantation. It depends upon the dose rate of the incident ions and its value corresponds to the thermal diffusion of boron in germanium at 800 deg C. (auth)
TL;DR: In this article, the influence of the length of the ion source outlet, the source pressure, and the source magnetic field on the properties of an ion beam was investigated and a variation of the outlet length conditions can be deduced for optimum design with respect to gas efficiency and profile shape.
Abstract: Beam profile measurements have been carried out to study the influence of the length of the ion source outlet, the source pressure, and the source magnetic field on the properties of an ion beam. From a variation of the outlet length conditions can be deduced for optimum design with respect to gas efficiency and profile shape. The profile width is found to decrease with increasing source pressure and decreasing magnetic field. This effect is attributed to a corresponding change in the energy distribution of the ions. Profile distortions occurring at high source pressure are likely to be due to ion scattering in the extraction region.
TL;DR: In this article, an ion source for studies of ion-neutral scattering experiments is described, which consists mainly of an ionizer of electron impact, an rf quadrupole mass filter and a deceleration lens system.
Abstract: An ion source for studies of ion-neutral scattering experiments is described. The ion source provides a mass selected ion beam of energies from several tens of eV to 1 eV or less, and delivers ion currents of 10-9 A at a high energy and 10-12 A at a low energy. The ion source consists mainly of an ionizer of electron impact, an rf quadrupole mass filter and a deceleration lens system. Transport lenses in front of and behind the rf quadrupole mass filter serve to maximize the transmission current to the subsequent deceleration lens. Beam properties together with optimum operating conditions are presented. Preliminary experimental results of elastic scattering are also presented.
Patent•
22 Jan 1973TL;DR: In this paper, the authors describe a crystal growing apparatus consisting of a Knudsen cell source of the surface ionization type, focusing means to focus, on a crystal substrate, an ion beam emitted from the ion source, deflection means to deflect the ion beam, detection means to detect the quantity of the ionbeam, an electron gun to generate an electron beam which neutralizes ions focused on the crystal substrate and a quadrupole mass filter to evaluate the ratio of partial pressure of the neutralized molecules within a vacuum specimen chamber.
Abstract: A crystal growing apparatus comprises a Knudsen cell source of the surface ionization type, focusing means to focus, on a crystal substrate, an ion beam emitted from the ion source, deflection means to deflect the ion beam, detection means to detect the quantity of the ion beam, an electron gun to generate an electron beam which neutralizes ions focused on the crystal substrate, and a quadrupole mass filter to evaluate the ratio of partial pressure of the neutralized molecules within a vacuum specimen chamber in which the crystal substrate exists, the ion beam being scanned on the substrate by the deflection means.
TL;DR: In this paper, the twin anode electrostatic ion source has been modified to produce two separate ion beams of equal intensity, which can be used to ion etch two specimens at the same time under identical conditions of beam density, ion energy and pressure.
Patent•
18 Dec 1973
TL;DR: In this article, a multiple ion beam type double focusing mass spectrometer is designed to control ion beams from a plurality of ion sources so as to form a single beam, and the single ion beam is introduced into an electric field while the accelerating voltages or electric field intensity is varied stepwise so that by means of the energy dispersion effect of said electric field, the respective ion beams accelerated at different accelerating voltage are repeatedly and sequentially introduced into a magnetic field.
Abstract: A multiple ion beam type double focusing mass spectrometer designed to control ion beams from a plurality of ion sources so as to form a single beam. The single ion beam is introduced into an electric field while the accelerating voltages or electric field intensity is varied stepwise so that by means of the energy dispersion effect of said electric field, the respective ion beams accelerated at different accelerating voltages are repeatedly and sequentially introduced into a magnetic field. At the output side of the magnetic detector, an ion detector detects said repeatedly and sequentially introduced ion beams and converts them into time shared signals.
TL;DR: In this paper, the kinetic theory of a drifting Maxwellian gas has been applied to the gas sampling problem in atmospheric density measurements aboard satellites and high velocity probes; and a molecular beam mass spectrometer has been developed for gas density measurements in the upper atmosphere which substantially eliminates gas surface scattering and gas surface reactions in the sample, and preserves the integrity of the gas sample during the analysis process.
Abstract: The kinetic theory of a drifting Maxwellian gas has been applied to the gas sampling problem in atmospheric density measurements aboard satellites and high velocity probes; and a molecular beam mass spectrometer has been developed for gas density measurements in the upper atmosphere which substantially eliminates gas‐surface scattering and gas‐surface reactions in the sample, and preserves the integrity of the gas sample during the analysis process. An ion source lens system has been developed and experimentally evaluated over the pressure range 10−7−10−4 Torr. The extracted ion beam was analyzed for energy distribution and angular distribution. For ion energy sufficiently high that the thermal energy of the gas can be neglected, the ion energy spread is less than 4 eV on‐axis and 90% of the ions are within 2.5° of the beam axis. It is concluded that the application of this technique to atmospheric composition studies will substantially improve our knowledge of the upper atmosphere of the earth and other ...
TL;DR: In this article, the alignment created by ion impact on gaseous targets can be used for atomic structure and collision process measurements both on the target and on the beam, and the information gathered from magnetic depolarization curves as measured for different incident energies and different target pressures leads to a measurement of the products gτ (Lande factor by mean life) and σ〈ν〉 (relaxation cross-section by mean velocity of secondary collision partners).
TL;DR: In this paper, the 20 keV argon ion beams were electrostatically deflected over a rock crystal target in a programmed manner, and the parabolically shaped surface showed unsymmetrical form.
Abstract: Techniques have been developed using ion bombardment to form wedge-shaped and parabolic surfaces. The 20 keV argon ion beams were electrostatically deflected over a rock crystal target in a programmed manner. The parabolically shaped surface showed unsymmetrical form. The effects of the spot size and the ion distribution are discussed.
TL;DR: A modulated mass spectrometer for ion bombardment work such as sputtering and radiation damage is presented in this article, which incorporates an oscillating electron beam ionizer of simple geometry but high ionization and extraction efficiencies.
Abstract: A modulated mass spectrometer for use in ion bombardment work such as sputtering and radiation damage is presented. The instrument incorporates an oscillating electron beam ionizer of simple geometry but high ionization and extraction efficiencies. Advantages offered are widely variable resolution, versatility in application and high sensitivity.