D
David P. Norton
Researcher at University of Florida
Publications - 549
Citations - 67855
David P. Norton is an academic researcher from University of Florida. The author has contributed to research in topics: Thin film & Pulsed laser deposition. The author has an hindex of 92, co-authored 549 publications receiving 66007 citations. Previous affiliations of David P. Norton include Harvard University & Louisiana State University.
Papers
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Journal ArticleDOI
Low-voltage indium gallium zinc oxide thin film transistors on paper substrates
Wantae Lim,Erica A. Douglas,David P. Norton,Stephen J. Pearton,Fan Ren,Young-Woo Heo,S. Y. Son,Junku Yuh +7 more
TL;DR: In this paper, bottom-gate amorphous (α-) indium-gallium-zincoxide (InGaZnO4) thin film transistors were fabricated on both paper and glass substrates at low processing temperature.
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Band gap properties of Zn1−xCdxO alloys grown by molecular-beam epitaxy
Xingjun Wang,Irina Buyanova,Weimin Chen,Morteza Izadifard,S. Rawal,David P. Norton,S. J. Pearton,Andrei Osinsky,J. W. Dong,Amir M. Dabiran +9 more
TL;DR: In this article, the compositional and temperature dependences of band gap energies of Zn1−xCdxO alloys grown by molecular-beam epitaxy were evaluated.
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Nitride and oxide semiconductor nanostructured hydrogen gas sensors
TL;DR: In this article, the progress of nitride and oxide semiconductor nanostructures for hydrogen gas sensing is discussed, and the use of catalyst metal coatings on GaN, InN and ZnO nanowires is found to greatly enhance the detection sensitivity.
Creating the Office of Strategy Management
Robert S. Kaplan,David P. Norton +1 more
TL;DR: In this article, the authors present a working paper for comment and discussion only, which is available from the author and can be viewed as a summary of the paper's entire contents.
Journal ArticleDOI
Superconducting magnesium diboride films with Tc \approx 24K grown by pulsed laser deposition with in-situ anneal
H. M. Christen,Hong-Ying Zhai,Claudia Cantoni,Mariappan Parans Paranthaman,Brian C. Sales,Christopher M. Rouleau,David P. Norton,David K. Christen,D. H. Lowndes +8 more
TL;DR: In this article, a systematic study of the influence of various in-situ annealing parameters shows an optimum temperature of about 600C in a background of 0.7 atm.