M
Michael A. Guillorn
Researcher at IBM
Publications - 246
Citations - 6446
Michael A. Guillorn is an academic researcher from IBM. The author has contributed to research in topics: Layer (electronics) & Gate oxide. The author has an hindex of 42, co-authored 246 publications receiving 6096 citations. Previous affiliations of Michael A. Guillorn include Oak Ridge National Laboratory & University of Tennessee.
Papers
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Journal ArticleDOI
Vertically Aligned Carbon Nanofibers and Related Structures: Controlled Synthesis and Directed Assembly
Anatoli V. Melechko,Vladimir I. Merkulov,Timothy E. McKnight,Michael A. Guillorn,Kate L. Klein,Douglas H. Lowndes,Michael L. Simpson +6 more
TL;DR: In this article, a review of the application areas for carbon nanotubes and nanofibers including electron field-emission sources, electrochemical probes, functionalized sensor elements, scanning probe microscopy tips, nanoelectromechanical systems (NEMS), hydrogen and charge storage, and catalyst support.
Proceedings ArticleDOI
High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling
Sarunya Bangsaruntip,Guy M. Cohen,Amlan Majumdar,Y. Zhang,Sebastian Engelmann,Nicholas C. M. Fuller,Lynne Gignac,S. Mittal,J. Newbury,Michael A. Guillorn,Tymon Barwicz,Lidija Sekaric,Martin M. Frank,Jeffrey W. Sleight +13 more
TL;DR: In this article, undoped-body, gate-all-around (GAA) Si nanowire (NW) MOSFETs with excellent electrostatic scaling were demonstrated.
Journal ArticleDOI
Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition
Vladimir I. Merkulov,Anatoli V. Melechko,Michael A. Guillorn,Douglas H. Lowndes,Michael L. Simpson +4 more
TL;DR: In this paper, the alignment of carbon nanofibers is explained as a result of a feedback mechanism associated with a nonuniform stress that is created across the interface of the catalyst particle with the CNF due to electrostatic forces.
Patent
Fin field effect transistor devices with self-aligned source and drain regions
TL;DR: Improved fin field effect transistor (FinFET) devices and methods for the fabrication thereof are provided in this paper, where a substrate is provided having a silicon layer thereon and a fin lithography hardmask is patterned on the silicon layer.
Journal ArticleDOI
Shaping carbon nanostructures by controlling the synthesis process
TL;DR: In this article, a technique that enables controlled synthesis of nanoscale carbon structures with conical and cylinder-on-cone shapes is presented. And a phenomenological model that explains the formation of these nanostructures and provides insight into methods for precisely engineering their shape is provided.