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Journal ArticleDOI

47.2: 2.8-inch WQVGA Flexible AMOLED Using High Performance Low Temperature Polysilicon TFT on Plastic Substrates

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TLDR
In this paper, a low-temperature polycrystalline silicon (LTPS) fabrication process on a plastic substrate for a flexible AMOLED display was reported. But the performance of fabricated TFTs showed excellent performance with field effect mobility of 124.1 cm2/V-s, on/off ratio of >108, subthreshold slope of 0.30V/dec, and threshold voltage of −2.03V.
Abstract
This paper reports a low-temperature polycrystalline silicon (LTPS) fabrication process on plastic substrate for a flexible AMOLED display. Characteristics of fabricated TFTs showed excellent performance with field effect mobility of 124.1 cm2/V-s, on/off ratio of >108, subthreshold slope of 0.30V/dec, and threshold voltage of −2.03V. Internal scan drive circuits, 1:3 demux, and compensation circuits were successfully integrated on the backplane of a 166ppi 2.8″ WQVGA flexible AMOLED panel.

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Citations
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Journal ArticleDOI

Low-Power Flexible Organic Light-Emitting Diode Display Device

TL;DR: In order to achieve a highly fl exible OLED display device, the following characteristics are needed: i) a low temperature process to prevent deformation in plastic substrates, ii) a new optical architecture providing both fl exibility and high outdoor readability, iii) a thinner and lighter platform than for current OLED technologies that allows bending and folding.
Journal ArticleDOI

A Highly Sensitive Capacitive Touch Sensor Integrated on a Thin-Film-Encapsulated Active-Matrix OLED for Ultrathin Displays

TL;DR: In this article, the optimal structure of the electrically noise-free capacitive touch sensor, which is assembled on a thin-film-encapsulated active-matrix OLED (AMOLED) display, is obtained by investigating the internal electrical field distribution and capacitance change.
Journal ArticleDOI

An OTFT-driven rollable OLED display

TL;DR: In this paper, an 80μm-thick rollable AMOLED display driven by an OTFT gate driver circuit was reported, which was successfully operated by an originally developed organic semiconductor, a peri-xanthenoxanthene derivative.
Journal ArticleDOI

Polysilicon thin-film transistors on polymer substrates

TL;DR: Different approaches to fabricate low-temperature polycrystalline silicon (LTPS) thin film transistors (TFTs) on polymer substrates are reviewed and the two main routes are discussed as discussed by the authors.
Journal ArticleDOI

Flexible sensing systems based on polysilicon thin film transistors technology

TL;DR: In this article, both chemical and physical sensors are integrated with low temperature polycrystalline silicon (LTPS) front-end electronics, where sensors and local signal conditioning circuits can be integrated on the same flexible substrate.
References
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Journal ArticleDOI

The electrical properties of polycrystalline silicon films

TL;DR: In this article, Boron doses of 1×1012-5×1015/cm2 were implanted at 60 keV into 1-μm-thick polysilicon films and Hall and resistivity measurements were made over a temperature range −50-250 °C.
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Low-temperature polysilicon thin film transistors on polyimide substrates for electronics on plastic

TL;DR: In this article, a low-temperature polycrystalline silicon (LTPS) thin film transistor (TFT) fabrication process on polyimide (PI) layers is presented.
Journal ArticleDOI

Laser dehydrogenation/crystallization of plasma‐enhanced chemical vapor deposited amorphous silicon for hybrid thin film transistors

TL;DR: In this article, a low temperature process for laser dehydrogenation and crystallization of hydrogenated amorphous silicon (a•Si:H) has been developed, which removes hydrogen by laser irradiations at three energy steps.
Journal ArticleDOI

Surface roughness effects in laser crystallized polycrystalline silicon

TL;DR: Two surface roughening mechanisms have been distinguished in laser crystallized polycrystalline Si: one is related to rapid release of hydrogen from hydrogen-rich plasma enhanced chemical vapor deposited amorphous Si and the other is independent of the hydrogen content of the material and is determined by the total number of pulses incident on the surface as discussed by the authors.
Journal ArticleDOI

Excimer laser recrystallization of nanocrystalline-Si films deposited by inductively coupled plasma chemical vapour deposition at 150°C

TL;DR: In this article, the authors report the characteristics of nanocrystalline silicon (nc-Si) irradiated by an excimer laser and report the grain size of the poly-Si film, which was recrystallized on the various buffer layers, was measured by scanning electron microscopy (SEM).
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