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Journal ArticleDOI

A theory of transistor cutoff frequency (f T ) falloff at high current densities

TLDR
In this paper, it was shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities.
Abstract
It is shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities. The base layer spreading mechanism derives from an analysis of the effect of the current-dependent buildup of the mobile-carrier space-charge density in the collector transition layer. Calculations show that at sufficiently high collector current levels, the mobile space-charge density in the collector transition layer cannot be considered negligible in comparison to the fixed charge density of that region. The over-all effect of taking the mobile space charge into account in analyzing the collector transition region is that, at high current densities, the transition region boundary adjacent to the neutral base layer is displaced toward the collector metal contact with increasing collector current. The attendant widening of the neutral base layer results in the observed, high-current falloff in f T . The application of this theory to transistor structures of both the alloy and mesa variety yields, in each case, calculated curves of f T vs I c which are in reasonably good agreement with experiment.

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Citations
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Proceedings ArticleDOI

High injection region analysis and optimization of power transistors

TL;DR: In this paper, a model of base widening and the associated inverse mode base conductivity modulation is proposed, and expressions for saturated current gain (hFE) and cutoff frequency (fT) in double-diffused transistors for exponential, Gaussian, and erfc base impurity profiles are also given.
Journal ArticleDOI

On the base region minority carrier concentration in narrow-base transistors

TL;DR: An empirical current and voltage-dependent boundary condition for the minority carrier concentration at the base edge of the collector-base depletion layer in a one-dimensional narrow-base transistor structure is presented in this paper.
Journal ArticleDOI

Current-voltage characteristics of bipolar transistors including quasi-saturation, finite collector lifetime, and high-low junction effects

TL;DR: In this article, a physics-based and compact model is developed to predict the bipolar transistor DC characteristics covering all saturation, quasi-saturation, and active operations, and the currentvoltage characteristics predicted by the present model compare favourably with that obtained from measurements and simulations reported in the literature.
DissertationDOI

Design and performance of a broadband microwave active inductor circuit with an application to amplifier design

TL;DR: In this paper, the authors propose a novel approach to deal with the problem of plagiarism in advertising: https://www.salvation-salvation.com/salvation/
Proceedings ArticleDOI

Testing the impact of process defects on ECL power-delay performance

TL;DR: The delay equation provides the insight into the sensitivity of various process defects in ECL gate delay and can be generalized to digital circuits other than ECL logic.
References
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Journal ArticleDOI

The theory of p-n junctions in semiconductors and p-n junction transistors

TL;DR: The theory of potential distribution and rectification for p-n junctions is developed with emphasis on germanium, resulting in an admittance for a simple case varying as (1 + iωτ p )1/2 where τ p is the lifetime of a hole in the n-region.
Journal ArticleDOI

Mobility of Holes and Electrons in High Electric Fields

TL;DR: In this paper, the field dependence of mobility has been determined for electrons and holes in both germanium and silicon, and the observed critical field at 298\ifmmode^\circ\else\textdegree\fi{}K beyond which $\ensuremath{\mu}$ varies as ${E}^{-}\frac{1}{2}}$.
Journal ArticleDOI

The Dependence of Transistor Parameters on the Distribution of Base Layer Resistivity

TL;DR: In this article, a method of analyzing transistor behavior for any base-layer impurity distribution is presented, in particular expressions for emitter efficiency, transverse sheet resistance R, transit time, and frequency cut-off f?.
Journal ArticleDOI

Structure-Determined Gain-Band Product of Junction Triode Transistors

TL;DR: In this article, the authors compared the power gain of the junction triode with those of the field effect transistor and the analog transistor and showed that the gain-band product is nearly independent of the particular alpha cutoff frequency selected.