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Journal ArticleDOI

A theory of transistor cutoff frequency (f T ) falloff at high current densities

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TLDR
In this paper, it was shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities.
Abstract
It is shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities. The base layer spreading mechanism derives from an analysis of the effect of the current-dependent buildup of the mobile-carrier space-charge density in the collector transition layer. Calculations show that at sufficiently high collector current levels, the mobile space-charge density in the collector transition layer cannot be considered negligible in comparison to the fixed charge density of that region. The over-all effect of taking the mobile space charge into account in analyzing the collector transition region is that, at high current densities, the transition region boundary adjacent to the neutral base layer is displaced toward the collector metal contact with increasing collector current. The attendant widening of the neutral base layer results in the observed, high-current falloff in f T . The application of this theory to transistor structures of both the alloy and mesa variety yields, in each case, calculated curves of f T vs I c which are in reasonably good agreement with experiment.

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Citations
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Journal ArticleDOI

Physics-based large-signal heterojunction bipolar transistor model for circuit simulation

TL;DR: In this paper, a comprehensive single heterojunction bipolar transistor (HBT) model suited for circuit simulation is presented, which adds important heterostructure device physics as well as physical properties of 3 or 4 compound materials such as AlGaAs and GaAs.
Proceedings ArticleDOI

InP HBT self-aligned technology for 40 Gbit/s ICs: fabrication and CAD geometric model

TL;DR: In this paper, the InP/InGaAs DHBT technology for 40 Gb/s ICs was presented and a geometric model based on a set of analytical equations was used for device geometry optimization.
Journal ArticleDOI

Transit time of fast bipolar transistors at high collector-current densities

TL;DR: In this article, a physical description of the forward transit time τf in fast bipolar transistors at high collector-current densities using only physical parameters is presented. But the model is restricted to the case of Si n-p-n transistors.
Journal ArticleDOI

Experimental and Theoretical Analyses of the Electrical SOA of Rugged p-Channel LDMOS

TL;DR: In this article, an electrical safe operating area analysis of a robust p-channel lateral DMOS transistor is performed, and the dependence of the trigger voltage on the length of channel and drift regions is analyzed, and tradeoff with the specific on-resistance (RDSon) is given.
Journal ArticleDOI

The interdependence between the collapse phenomenon and the avalanche breakdown in AlGaAs/GaAs power heterojunction bipolar transistors

TL;DR: In this paper, a theoretical analysis of the interaction between the collapse and carrier ionization multiplication in the collector was presented, and it was shown that the previous qualitative description of the interdependence of collapse and the avalanche breakdown, while being mostly accurate, requires modification.
References
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Journal ArticleDOI

The theory of p-n junctions in semiconductors and p-n junction transistors

TL;DR: The theory of potential distribution and rectification for p-n junctions is developed with emphasis on germanium, resulting in an admittance for a simple case varying as (1 + iωτ p )1/2 where τ p is the lifetime of a hole in the n-region.
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Mobility of Holes and Electrons in High Electric Fields

TL;DR: In this paper, the field dependence of mobility has been determined for electrons and holes in both germanium and silicon, and the observed critical field at 298\ifmmode^\circ\else\textdegree\fi{}K beyond which $\ensuremath{\mu}$ varies as ${E}^{-}\frac{1}{2}}$.
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The Dependence of Transistor Parameters on the Distribution of Base Layer Resistivity

TL;DR: In this article, a method of analyzing transistor behavior for any base-layer impurity distribution is presented, in particular expressions for emitter efficiency, transverse sheet resistance R, transit time, and frequency cut-off f?.
Journal ArticleDOI

Structure-Determined Gain-Band Product of Junction Triode Transistors

TL;DR: In this article, the authors compared the power gain of the junction triode with those of the field effect transistor and the analog transistor and showed that the gain-band product is nearly independent of the particular alpha cutoff frequency selected.