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Journal ArticleDOI

A theory of transistor cutoff frequency (f T ) falloff at high current densities

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TLDR
In this paper, it was shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities.
Abstract
It is shown that the observed falloff in the f T of a transistor at high currents is due to the spreading of the neutral base layer into the collector region of the device at high current densities. The base layer spreading mechanism derives from an analysis of the effect of the current-dependent buildup of the mobile-carrier space-charge density in the collector transition layer. Calculations show that at sufficiently high collector current levels, the mobile space-charge density in the collector transition layer cannot be considered negligible in comparison to the fixed charge density of that region. The over-all effect of taking the mobile space charge into account in analyzing the collector transition region is that, at high current densities, the transition region boundary adjacent to the neutral base layer is displaced toward the collector metal contact with increasing collector current. The attendant widening of the neutral base layer results in the observed, high-current falloff in f T . The application of this theory to transistor structures of both the alloy and mesa variety yields, in each case, calculated curves of f T vs I c which are in reasonably good agreement with experiment.

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Citations
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Journal ArticleDOI

A simple regional analysis of transit times in bipolar transistors

TL;DR: In this paper, the authors propose a quasi-static approach to calculate the cutoff frequency or unity gain bandwidth of a one-dimensional bipolar transistor by means of a numerical device simulation program, where the total transit time from emitter contact to collector contact is subdivided into five physically meaningful components.
Journal ArticleDOI

Foundation of rf CMOS and SiGe BiCMOS technologies

TL;DR: The paper reviews the process development and integration methodology, presents the device characteristics, and shows how the development and device selection were geared toward usage in mixed-signal IC development.
Journal ArticleDOI

A new effect at high currents in heterostructure bipolar transistors

TL;DR: In this article, large current densities in heterostructure bipolar transistors with heterostructured collectors are shown to cause an excess electron barrier leading to an increase in minority-carrier charge storage in the base and a decrease in current gain of the device.
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Two-dimensional carrier flow in a transistor structure under nonisothermal conditions

TL;DR: In this article, a two-dimensional mathematical model is developed to predict the internal behavior of power transistors operating under steady-state conditions, which includes the internal self-heating effects in the transistors and is applicable to predict transistor behavior under high current and high-voltage operating conditions.
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Accurate analytical delay expressions for ECL and CML circuits and their applications to optimizing high-speed bipolar circuits

TL;DR: In this article, a linearity study of the propagation delay of bipolar circuits carried out using a SPICE program is discussed, and therefore analytical propagation delay expressions for ECL and CML circuits are derived using a sensitivity analysis.
References
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Journal ArticleDOI

The theory of p-n junctions in semiconductors and p-n junction transistors

TL;DR: The theory of potential distribution and rectification for p-n junctions is developed with emphasis on germanium, resulting in an admittance for a simple case varying as (1 + iωτ p )1/2 where τ p is the lifetime of a hole in the n-region.
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Mobility of Holes and Electrons in High Electric Fields

TL;DR: In this paper, the field dependence of mobility has been determined for electrons and holes in both germanium and silicon, and the observed critical field at 298\ifmmode^\circ\else\textdegree\fi{}K beyond which $\ensuremath{\mu}$ varies as ${E}^{-}\frac{1}{2}}$.
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The Dependence of Transistor Parameters on the Distribution of Base Layer Resistivity

TL;DR: In this article, a method of analyzing transistor behavior for any base-layer impurity distribution is presented, in particular expressions for emitter efficiency, transverse sheet resistance R, transit time, and frequency cut-off f?.
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Structure-Determined Gain-Band Product of Junction Triode Transistors

TL;DR: In this article, the authors compared the power gain of the junction triode with those of the field effect transistor and the analog transistor and showed that the gain-band product is nearly independent of the particular alpha cutoff frequency selected.