Journal ArticleDOI
Controlling the boron-to-titanium ratio in magnetron-sputter-deposited TiBx thin films
Ivan Petrov,Allen Hall,Antonio B. Mei,Nils Nedfors,Igor Zhirkov,Johanna Rosen,Amber N. Reed,Brandon M. Howe,Grzegorz Greczynski,Jens Birch,Lars Hultman,Joseph E Greene +11 more
TLDR
In this article, the authors show that the use of highly magnetically unbalanced magnetron sputtering leads to selective ionization of sputter-ejected Ti atoms which are steered via an external magnetic field to the film, thus establishing control of the B/Ti ratio with the ability to obtain stoichiometric TiB2 films over a wide range in Ar sputtering pressures.Abstract:
Magnetron sputter-deposited TiBx films grown from TiB2 targets are typically highly overstoichiometric with x ranging from 3.5 to 2.4 due to differences in Ti and B preferential ejection angles and gas-phase scattering during transport between the target and the substrate. The authors show that the use of highly magnetically unbalanced magnetron sputtering leads to selective ionization of sputter-ejected Ti atoms which are steered via an external magnetic field to the film, thus establishing control of the B/Ti ratio with the ability to obtain stoichiometric TiB2 films over a wide range in Ar sputtering pressures.read more
Citations
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Journal ArticleDOI
Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Al
Babak Bakhit,Justinas Palisaitis,Jimmy Thörnberg,Johanna Rosen,Per Persson,Lars Hultman,Ivan Petrov,Ivan Petrov,Ivan Petrov,Joseph E Greene,Joseph E Greene,Joseph E Greene,Grzegorz Greczynski +12 more
TL;DR: In this paper, the effect of Al addition on the oxidation properties of sputter-deposited TiB2-rich Ti1-xAlxBy thin films was studied and it was shown that alloying the films with Al significantly increased the oxidation resistance with a slight decrease in hardness.
Journal ArticleDOI
Recent Advances in Turning Processes Using Coated Tools—A Comprehensive Review
TL;DR: In this paper, a presentation of various recently published papers on this subject is going to be made, mentioning the various types of coatings that have recently been used in the turning process, the turning of hard to machine materials, such as titanium alloys and Inconel, as well as the interaction of these coatings with the turned surfaces, the wear patterns that these coatingings suffer during the turning, and relating these wear mechanisms to the coated tool's life expectancy.
Journal Article
The influence of low-energy ion bombardment on themicrostructure development and mechanical properties of TiBxcoatings
Marián Mikula,Branislav Grančič,Tomas Roch,Tomas Plecenik,Ivo Vávra,Edmund Dobročka,Alexander Satka,Vilma Buršíková,Milan Držík,Miroslav Zahoran,Andrej Plecenik,Peter Kúš +11 more
TL;DR: In this paper, the influence of deposition parameters on the growth, structure and mechanical properties of the TiBx coatings is investigated, and it is shown that low-energy ion bombardment (Ei) of growing TiBX coating influences the preference orientation of TiB2 crystallites.
Journal ArticleDOI
Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering
Mikhail N. Polyakov,Marcus Morstein,Xavier Maeder,Thomas Nelis,Thomas Nelis,Daniel Lundin,Juri Wehrs,James P. Best,Thomas Edward James Edwards,Max Döbeli,J. Michler +10 more
TL;DR: In this article, a new HiPIMS-based TiB2 process and a high average power process optimization from a cylindrical rotating magnetron fitted with ceramic titanium diboride as the target material are reported.
Journal ArticleDOI
Synthesis and characterization of (Ti1-Al )B2+ thin films from combinatorial magnetron sputtering
Aurelija Mockuté,Justinas Palisaitis,Nils Nedfors,Pedro Berastegui,Esteban Broitman,Björn Alling,Lars-Åke Näslund,Lars Hultman,J. Patscheider,Ulf Jansson,Per Persson,Johanna Rosen +11 more
TL;DR: In this paper, a dual magnetron sputtering at 400°C from sintered TiB2 and AlB2 targets was used to sample the microstructures of Ti-and Al-rich diboride nanometer-size domains.
References
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Journal ArticleDOI
Microstructural evolution during film growth
TL;DR: In this paper, the authors review the present understanding of film growth processes and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth.
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Use of an externally applied axial magnetic field to control ion/neutral flux ratios incident at the substrate during magnetron sputter deposition
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Journal ArticleDOI
Self-organized nanocolumnar structure in superhard TiB2 thin films
TL;DR: In this article, high-resolution transmission electron microscopy was used to show that overstoichiometric TiB2 has a complex self-organized columnar nanostructure, which is thermally stable to postannealing temperatures up to 700°C.
Journal ArticleDOI
Borides in Thin Film Technology
TL;DR: In this article, a review of physical vapor deposition (PVD) techniques used for the deposition of these coatings is given, and a survey of investigations to apply them is given.