Demonstration of submicron square-like silicon waveguide using optimized LOCOS process
TLDR
The design, fabrication and experimental characterization of a submicron-scale silicon waveguide that is fabricated by local oxidation of silicon is demonstrated and the low loss characteristics of the waveguide are demonstrated by imaging the light scattering using an infrared camera.Abstract:
We demonstrate the design, fabrication and experimental characterization of a submicron-scale silicon waveguide that is fabricated by local oxidation of silicon. The use of local oxidation process allows defining the waveguide geometry and obtaining smooth sidewalls. The process can be tuned to precisely control the shape and the dimensions of the waveguide. The fabricated waveguides are measured using near field scanning optical microscope at 1550 nm wavelength. These measurements show mode width of 0.4 µm and effective refractive index of 2.54. Finally, we demonstrate the low loss characteristics of our waveguide by imaging the light scattering using an infrared camera.read more
Citations
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Silicon-chip mid-infrared frequency comb generation
Austin G. Griffith,Ryan K. W. Lau,Jaime Cardenas,Yoshitomo Okawachi,Aseema Mohanty,Romy Fain,Yoon Ho Daniel Lee,Mengjie Yu,Christopher T. Phare,Carl B. Poitras,Alexander L. Gaeta,Michal Lipson +11 more
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