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Electromigration and electronic device degradation

Aris Christou
TLDR
Christou et al. as mentioned in this paper studied the effect of metal-semiconductor properties on the stability of multilayer metal-Semiconductor systems on GaAs and showed that the stability and reliability of these systems depend on the temperature of the GaAs.
Abstract
Reliability and Electromigration Degradation of GaAs Microwave Monolithic Integrated Circuits (A. Christou). Simulation and Computer Models for Electromigration (P. Tang). Temperature Dependencies on Electromigration (M. Pecht & P. Lall). Electromigration and Related Failure Mechanisms in VLSI Metallizations (A. Christou & M. Peckerar). Metallic Electromigration Phenomena (S. Krumbein). Theoretical and Experimental Study of Electromigration (J. Zhao). GaAs on Silicon Performance and Reliability (P. Panayotatos, et al.). Electromigration and Stability of Multilayer Metal--Semiconductor Systems on GaAs (A. Christou). Electrothermomigration Theory and Experiments in Aluminum Thin Film Metallizations (A. Christou). Reliable Metallization for VLSI (M. Peckerar). Index.

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