Journal ArticleDOI
Galvanostatic electrodeposition and microstructure of copper (I) oxide film
Yanchun Zhou,Jay A. Switzer +1 more
TLDR
In this article, the effect of bath temperature, bath pH and current density on the compositon, grain size, surface texture and surface morphology of the electrodeposited polycrystalline copper (I) oxide films were investigated.Abstract:
Polycrystalline copper (I) oxide films were deposited on stainless steel substrate by galvanostatic electrodeposition method and were characterized by Xray diffraction and scanning electron microscopy. The effect of bath temperature, bath pH and current density on the compositon, grain size, surface texture and surface morphology of the electrodeposited films were investigated. The films deposited at low bath pH (less than or equal to 7) consisted of copper (I) oxide and metallic copper; while the films deposited at bath pH between 8 and 12 and bath temperature of 60 degrees C were pure copper (I) oxide. The preferred orientation of the copper (I) oxide films depended on the relative growth rate of (111) and (200) faces and could be controlled by adjusting the bath pH and/or the cathodic current density. (100)-oriented copper (1) oxide films could be deposited at pH=9 and current densities in the range of 0.25-1 mA/cm(2) while (111)-oriented films could be prepared at pH=12 or at pH=9 using the current densities between 1.5-2.5 mA/cm(2). Computer simulated crystallite shapes showed that the crystal shape changed from octahedral for (100)-oriented film to trucated pyramids and cubs for (111)-oriented film. And they were approved by scanning electron microscopy.read more
Citations
More filters
Journal ArticleDOI
Electrochemical Crystallization of Cuprous Oxide with Systematic Shape Evolution
Journal ArticleDOI
Synthesis and Characterization of High-Photoactivity Electrodeposited Cu2O Solar Absorber by Photoelectrochemistry and Ultrafast Spectroscopy
TL;DR: In this article, the effects of electrodeposition parameters on the photoelectrochemical properties of Cu2O films were investigated under different conditions and correlation of photoresponse to morphology, film orientation, and electrical properties.
Journal ArticleDOI
Photocurrent enhancement of n-type Cu2O electrodes achieved by controlling dendritic branching growth.
TL;DR: The resulting electrodes showed n-type behavior by generating anodic photocurrent without applying an external bias (zero-bias photocurrent under short-circuit condition) in an Ar-purged 0.02 M K(2)SO(4) solution.
Journal ArticleDOI
Shape- and Size-Selective Electrochemical Synthesis of Dispersed Silver(I) Oxide Colloids
TL;DR: Silver(I) oxide (Ag2O) micro- and nanoparticles were electrochemically synthesized by anodizing a sacrificial silver wire in a basic aqueous sulfate solution resulting in the generation of 8-fold symmetric "flower"-shaped particles formed as a consequence of fast growth in the <111> crystallographic direction.
Journal ArticleDOI
Effect of Junction Morphology on the Performance of Polycrystalline Cu2O Homojunction Solar Cells
TL;DR: In this paper, the surface morphology of p-type Cu2O was determined by electrochemical deposition of the p-Cu2O layer followed by the n-Cu 2O layer.
References
More filters
Journal Article
A new law of crystal morphology extending the law of Bravais
J. D. H. Donnay,David Harker +1 more
Journal ArticleDOI
Properties of reactively-sputtered copper oxide thin films
V.F. Drobny,L. Pulfrey +1 more
TL;DR: In this article, the properties of phase composition, resistivity and optical constants were investigated and the phases Cu+Cu2O, Cu2O+Cu+CuO, etc.
Journal ArticleDOI
Electrochemical Synthesis and Sintering of Nanocrystalline Cerium(IV) Oxide Powders
TL;DR: In this article, nanocrystalline CeO{sub 2} powders were prepared electrochemically by the cathodic electrogeneration of base, and their sintering behavior was investigated.
Journal ArticleDOI
Chemical deposition of Cu2O thin films
TL;DR: In this paper, a simple method for the chemical deposition of Cu 2 O thin films is described, and the films obtained by this method are of high chemical purity and their thicknesses can easily be controlled during the deposition process.