Nano-chemistry and scanning probe nanolithographies
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This tutorial review presents the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface.Abstract:
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.read more
Citations
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Journal ArticleDOI
Feature size dependence on hysteresis due to relative humidity ramping and patterning order in dip-pen nanolithography
Omkar A. Nafday,Brandon L. Weeks +1 more
TL;DR: Investigation of the effect of variability in meniscus shape due to RH on the feature size of patterns written with mercaptohexadecanoic acid on a gold substrate, using dip-pen nanolithography (DPN).
Book ChapterDOI
Scanning Probe Microscopy for Nanolithography
Abstract: Scanning probe microscopy (SPM) has been used for both fabrication and characterization techniques of nanomaterials, nanostructures, or nanopatterning. There are two fundamental approaches such as scanning tunneling microscopy (STM) and atomic force microscopy (AFM) that are being used for the scanning probe lithography (SPL) process. In this chapter, we will discuss a recent development of nanolithography based upon new ideas and innovations of scanning probe microscopy and direct-write approach.
Journal ArticleDOI
Tunable atomic force microscopy bias lithography on electron beam induced carbonaceous platforms
TL;DR: In this paper, the electron beam induced carbonaceous deposition (EBICD) was used to create reversible charge patterns on the EBICD surfaces under low (30%) humidity conditions.
Proceedings ArticleDOI
Investigation of scratching nano grooves on aluminum film
TL;DR: In this paper, a Berkovich indenter with a sharp triangular pyramid diamond tip, whose tip radius is less than 50 nm, is used as a scriber to scratch aluminum film in these tests, and it is shown that scratch the material by single face of the tip is the best direction to efficiently generate the chips.
References
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Journal ArticleDOI
"Dip-Pen" Nanolithography
TL;DR: A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode, making DPN a potentially useful tool for creating and functionalizing nanoscale devices.
Journal ArticleDOI
The evolution of dip-pen nanolithography.
TL;DR: The Dip-Pen Nanolithography (DPN) is a direct-write tool for generating surface-patterned chemical functionality on the sub-100 nm length-scale as discussed by the authors.
Journal ArticleDOI
Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air
TL;DR: In this paper, the chemical modification of hydrogen-passivated n-Si surfaces by a scanning tunneling microscope (STM) operating in air is reported, and the modified surface regions have been characterized by STM spectroscopy, scanning electron microscopy (SEM), time-of-flight secondary ion mass spectrometry (TOF SIMS), and chemical etch/Nomarski microscopy.
Journal ArticleDOI
Patterning: Principles and Some New Developments
Matthias Geissler,Y. Xia +1 more
TL;DR: An overview of various patterning methodologies can be found in this paper, which is organized into three major sections: generation of patterns, replication of patterns and three-dimensional patterning.
Journal ArticleDOI
Atomic force microscope tip-induced local oxidation of silicon: kinetics, mechanism, and nanofabrication
TL;DR: In this article, the authors examined the kinetics and mechanism of local oxidation of silicon and how factors such as the strength of the electric field, ambient humidity, and thickness of the oxide affect its rate and resolution.