Nano-chemistry and scanning probe nanolithographies
Reads0
Chats0
TLDR
This tutorial review presents the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface.Abstract:
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.read more
Citations
More filters
Journal ArticleDOI
High-speed atomic force microscopy for materials science
TL;DR: High-speed atomic force microscopy (HS-AFM) as discussed by the authors can achieve megapixels per second over scan areas of square millimetres, removing the limitations from AFM for industrial scale materials characterisation.
Journal ArticleDOI
Site-selective optical coupling of PbSe nanocrystals to Si-based photonic crystal microcavities.
Andras G. Pattantyus-Abraham,Haijun Qiao,Jingning Shan,Keith A. Abel,Tiansi Wang,Frank C. J. M. van Veggel,Jeff F. Young +6 more
TL;DR: This patterning technique allows for the selective deposition of PbSe nanocrystals at the main antinode of the silicon-based microcavities, and more than a 10-fold photoluminescence enhancement due to the cavity-nanocrystal coupling was observed.
Journal ArticleDOI
Parallel-local anodic oxidation of silicon surfaces by soft stamps
Cristiano Albonetti,Javier Martínez,N. S. Losilla,Pierpaolo Greco,Massimiliano Cavallini,Francesco Borgatti,Monica Montecchi,Luca Pasquali,Ricardo Garcia,Fabio Biscarini +9 more
TL;DR: The fabrication of nanometric patterns on silicon surfaces by using the parallel-local anodic oxidation technique with soft stamps yields silicon oxide nanostructures 15 nm high, namely at least five times higher than the nanostructure made with local anodic oxidation using atomic force microscopy, and thanks to the size of the stamp enables one to pattern the surface across a centimetre length scale.
Journal ArticleDOI
Excluding Contact Electrification in Surface Potential Measurement Using Kelvin Probe Force Microscopy
TL;DR: It is demonstrated that the tapping-mode topography scan pass during the typical dual-pass KPFM measurement may trigger contact electrification between the probe and the sample, which leads to a charged sample surface and thus can introduce a significant error to the surface potential measurement.
Journal ArticleDOI
Large-scale nanopatterning of single proteins used as carriers of magnetic nanoparticles
Ramses V. Martinez,Javier Martínez,Marco Chiesa,Ricardo Garcia,Eugenio Coronado,Elena Pinilla-Cienfuegos,Sergio Tatay +6 more
TL;DR: A variety of methods based on Coulomb-force-directed assembly of nanoparticles have been proposed, but the supramolecular organization attained from the ‘‘bottom-up’’ approaches either does not allow accurate placement of the desired structures on a specific region of an inhomogeneous surface.
References
More filters
Journal ArticleDOI
"Dip-Pen" Nanolithography
TL;DR: A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode, making DPN a potentially useful tool for creating and functionalizing nanoscale devices.
Journal ArticleDOI
The evolution of dip-pen nanolithography.
TL;DR: The Dip-Pen Nanolithography (DPN) is a direct-write tool for generating surface-patterned chemical functionality on the sub-100 nm length-scale as discussed by the authors.
Journal ArticleDOI
Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air
TL;DR: In this paper, the chemical modification of hydrogen-passivated n-Si surfaces by a scanning tunneling microscope (STM) operating in air is reported, and the modified surface regions have been characterized by STM spectroscopy, scanning electron microscopy (SEM), time-of-flight secondary ion mass spectrometry (TOF SIMS), and chemical etch/Nomarski microscopy.
Journal ArticleDOI
Patterning: Principles and Some New Developments
Matthias Geissler,Y. Xia +1 more
TL;DR: An overview of various patterning methodologies can be found in this paper, which is organized into three major sections: generation of patterns, replication of patterns and three-dimensional patterning.
Journal ArticleDOI
Atomic force microscope tip-induced local oxidation of silicon: kinetics, mechanism, and nanofabrication
TL;DR: In this article, the authors examined the kinetics and mechanism of local oxidation of silicon and how factors such as the strength of the electric field, ambient humidity, and thickness of the oxide affect its rate and resolution.