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Nano-chemistry and scanning probe nanolithographies

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TLDR
This tutorial review presents the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface.
Abstract
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.

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Journal ArticleDOI

Formation of titanium nanooxide superclusters under the tip of a scanning tunneling microscope

TL;DR: In high-vacuum experiments (at the pressure P ≈ 5 × 10−10 mbar), it has been found that oxide superclusters up to several tens of nanometers in dimensions are formed at the oxidized titanium surface under the tip of a scanning tunneling microscope as mentioned in this paper.
Journal ArticleDOI

Confined Etchant Layer Technique: An Electrochemical Approach to Micro-/Nanomachining

TL;DR: The Confined etchant layer technique (CELT) as mentioned in this paper was proposed by Zhao-Wu Tian in the early 1990s and is a forward-looking electrochemical micro-/nanomachining for both the fabrications of three-dimensional micro-nanostructures (3D-MNSs) and the polishing of supersmooth surfaces.
Proceedings ArticleDOI

Bidirectional reflectance distribution of a 2D thin-film photonic crystal patterned using an atomic-force microscope

TL;DR: In this article, a diamond nano-indentation AFM was used to generate a two-dimensional square array of sub-wavelength surface features from a single material at a scale large enough to permit optical characterization.
Posted Content

Generation of a retro-reflected wave by interaction of an evanescent wave with a sub-wavelength structure

TL;DR: In this paper, the authors examined the mechanisms for generation of a retro-reflected wave from the interaction of an evanescent wave with a sub-wavelength structure using the finite-difference time-domain (FDTD) method.
References
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Journal ArticleDOI

"Dip-Pen" Nanolithography

TL;DR: A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode, making DPN a potentially useful tool for creating and functionalizing nanoscale devices.
Journal ArticleDOI

The evolution of dip-pen nanolithography.

TL;DR: The Dip-Pen Nanolithography (DPN) is a direct-write tool for generating surface-patterned chemical functionality on the sub-100 nm length-scale as discussed by the authors.
Journal ArticleDOI

Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air

TL;DR: In this paper, the chemical modification of hydrogen-passivated n-Si surfaces by a scanning tunneling microscope (STM) operating in air is reported, and the modified surface regions have been characterized by STM spectroscopy, scanning electron microscopy (SEM), time-of-flight secondary ion mass spectrometry (TOF SIMS), and chemical etch/Nomarski microscopy.
Journal ArticleDOI

Patterning: Principles and Some New Developments

TL;DR: An overview of various patterning methodologies can be found in this paper, which is organized into three major sections: generation of patterns, replication of patterns and three-dimensional patterning.
Journal ArticleDOI

Atomic force microscope tip-induced local oxidation of silicon: kinetics, mechanism, and nanofabrication

TL;DR: In this article, the authors examined the kinetics and mechanism of local oxidation of silicon and how factors such as the strength of the electric field, ambient humidity, and thickness of the oxide affect its rate and resolution.
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