Nano-chemistry and scanning probe nanolithographies
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TLDR
This tutorial review presents the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface.Abstract:
The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.read more
Citations
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Light induced conch-shaped relief in an azo-polymer film.
TL;DR: It is discovered that a novel chiral structured surface relief with a height of over 1 μm can be formed in an azo-polymer film merely by employing circularly polarized optical vortex irradiation with a total angular momentum of j = ±2.
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Silicon nanowire transistor with a channel width of 4 nm fabricated by atomic force microscope nanolithography
TL;DR: An atomic force microscopy lithography that enables the reproducible fabrication of complex single-crystalline silicon nanowire field-effect transistors with a high electrical performance is demonstrated.
Journal ArticleDOI
Supramolecular nanostructuring of silver surfaces via self-assembly of [60]fullerene and porphyrin modules
Davide Bonifazi,Andreas Kiebele,Meike Stöhr,Fuyong Cheng,Thomas A. Jung,François Diederich,Hannes Spillmann +6 more
TL;DR: In this article, a bottom-up fabrication of addressable multicomponent molecular entities obtained by self-assembly of C60 and porphyrins on Ag(100) and Ag(111) surfaces is described.
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Correction of the tip convolution effects in the imaging of nanostructures studied through scanning force microscopy
TL;DR: It is demonstrated that for a constant tip radius, the convolution error is increased with the object height, mainly for the narrowest motifs.
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Atomic force microscope nanolithography: dip-pen, nanoshaving, nanografting, tapping mode, electrochemical and thermal nanolithography
Luis G. Rosa,Jian Liang +1 more
TL;DR: The various forms of the technique, such as nanoshaving, nanografting and dip-pen nanolithography, are introduced, which are classified according to the different interactions between the AFM probe and the substrate during thenanolithography fabrication process.
References
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"Dip-Pen" Nanolithography
TL;DR: A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode, making DPN a potentially useful tool for creating and functionalizing nanoscale devices.
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The evolution of dip-pen nanolithography.
TL;DR: The Dip-Pen Nanolithography (DPN) is a direct-write tool for generating surface-patterned chemical functionality on the sub-100 nm length-scale as discussed by the authors.
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Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air
TL;DR: In this paper, the chemical modification of hydrogen-passivated n-Si surfaces by a scanning tunneling microscope (STM) operating in air is reported, and the modified surface regions have been characterized by STM spectroscopy, scanning electron microscopy (SEM), time-of-flight secondary ion mass spectrometry (TOF SIMS), and chemical etch/Nomarski microscopy.
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Patterning: Principles and Some New Developments
Matthias Geissler,Y. Xia +1 more
TL;DR: An overview of various patterning methodologies can be found in this paper, which is organized into three major sections: generation of patterns, replication of patterns and three-dimensional patterning.
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Atomic force microscope tip-induced local oxidation of silicon: kinetics, mechanism, and nanofabrication
TL;DR: In this article, the authors examined the kinetics and mechanism of local oxidation of silicon and how factors such as the strength of the electric field, ambient humidity, and thickness of the oxide affect its rate and resolution.