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Journal ArticleDOI

Nanofabricated Concentric Ring Structures by Templated Self-Assembly of a Diblock Copolymer

Yeon Sik Jung, +2 more
- 08 Aug 2008 - 
- Vol. 8, Iss: 9, pp 2975-2981
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TLDR
This work provides a simple process for the fabrication of nanoscale circular patterns with very narrow line width using a much coarser-scale template, and may facilitate the miniaturization of a variety of microelectronic devices.
Abstract
The formation of well-controlled circular patterns on the nanoscale is important for the fabrication of a range of devices such as sensors, memories, lasers, transistors, and quantum devices. Concentric, smooth ring patterns with tunable dimensions have been formed from a cylinder-forming poly(styrene-b-dimethylsiloxane) (PS-PDMS) diblock copolymer under confinement in shallow circular trenches. The high etch selectivity between PS and PDMS facilitates pattern transfer, illustrated by the fabrication of arrays of ferromagnetic cobalt rings with a density of 1.1 × 109/cm2. The effects of confinement diameter and commensurability on the diameter and period of the concentric rings are analyzed using a free energy model that includes interfacial, strain, and bending energies. This work provides a simple process for the fabrication of nanoscale circular patterns with very narrow line width using a much coarser-scale template, and may facilitate the miniaturization of a variety of microelectronic devices.

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Citations
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Functional block copolymers: nanostructured materials with emerging applications.

TL;DR: This Review illustrates recent progress in the field of block copolymer materials by highlighting selected emerging applications by highlightingselected emerging applications.
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Micro‐/Nanostructured Mechanical Metamaterials

TL;DR: Various aspects of the micro-/nano-structured materials as mechanical metamaterials, potential tools for their multidimensional fabrication, and selected methods for their structural and performance characterization are described, as well as some prospects for the future developments in this exciting and emerging field.
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Directed self-assembly of block copolymers for use in bit patterned media fabrication

TL;DR: In this article, the authors review the latest research into two different block copolymer directed self-assembly (BCP DSA) techniques: graphoepitaxy and chemo-peitaxy (or chemical prepatterning).
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Complex self-assembled patterns using sparse commensurate templates with locally varying motifs

TL;DR: It is shown that an array of carefully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be used to template complex patterns in a cylindrical-morphology block copolymer.
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Directed self-assembly of block copolymers for next generation nanolithography

TL;DR: In this article, the authors highlight the recent progress in the development of the directed self-assembly process for practical utilization in semiconductor applications and highlight the practical advantages anticipated from directed selfassembly integration, such as pattern density multiplication, feature size uniformity improvement, line edge roughness reduction, and cost reduction.
References
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Journal ArticleDOI

Significance of Electromagnetic Potentials in the Quantum Theory

TL;DR: In this article, it was shown that there exist effects of potentials on charged particles, even in the region where all the fields (and therefore the forces on the particles) vanish.
Journal ArticleDOI

Directing the self-assembly of block copolymers

TL;DR: A review of block copolymers can be found in this paper, which summarizes existing applications and alignment techniques and provides an outlook toward the future. But, with few exceptions, the alignment methods are general to a specific morphology or set of morphologies.
Journal ArticleDOI

Directed assembly of block copolymer blends into nonregular device-oriented structures.

TL;DR: Ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays are directed to assemble into nonregular device-oriented structures on chemically nanopatterned substrates for defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk.
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