Journal ArticleDOI
Oxidation of Ge implanted into SiO2 layers: Modeling and XPS
TLDR
In this article, a depth profiling by ion beam sputtering caused collisional mixing of the subsurface region, which modifies the XPS signal, and the results indicate possible improvement of the depth profiling XPS method to be used in future experiments.Abstract:
During annealing at 950°C in an oxidizing ambient, the redistribution of Ge in Ge + -implanted SiO 2 layer is influenced by the germanium oxidation. Crystalline clusters precipitate immediately after sample heating. During the annealing an oxidation front proceeds into the layer, consuming crystalline clusters and leaving behind glassy precipitates barely visible by XTEM. Sputtering depth profiling in conjunction with the X-ray photoelectron spectroscopy (XPS) analysis was applied in order to identify the chemical state of both the precipitated Ge and that dissolved in the silicon dioxide matrix. For a reliable interpretation of the measured data, modeling of the physical processes involved in the depth profiling XPS technique was performed. It is shown that the depth profiling by ion beam sputtering causes collisional mixing of the subsurface region, which modifies the XPS signal. The results indicate possible improvement of the depth profiling XPS method to be used in future experiments.read more
Citations
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Journal ArticleDOI
Formation of a single interface-near, δ-like Ge nanocluster band in thin SiO2 films using ion-beam synthesis
TL;DR: In this paper, the role of post-implantation annealing conditions for the formation of Ge nanoclusters in the center of the layer, near the interface, or in both regions is discussed.
Journal ArticleDOI
Thermal oxidation of Si (001) single crystal implanted with Ge ions
Antonio Terrasi,Silvia Scalese,M. Re,Emanuele Rimini,F. Iacona,Vito Raineri,F. La Via,S. Colonna,Settimio Mobilio +8 more
TL;DR: In this paper, the surface roughness is related to the segregation of Ge at the oxide/substrate interface, occurring when the oxidation rate is faster than the Ge diffusion, in particular at the higher implanted dose (3×1016 cm−2) when processed in a wet ambient.
Journal ArticleDOI
Composition of Ge+ and Si+ implanted SiO2/Si layers: Role of oxides in nanocluster formation
TL;DR: In this paper, X-ray photoelectron spectroscopy (XPS) has been used to examine the atomic content of implanted SiO 2 /Si layers, revealing valuable information about the formation mechanism of Ge and Si nanoclusters.
Journal ArticleDOI
Investigation of the formation and phase transition of Ge and Co nanoparticles in a SiO2 matrix
TL;DR: In this paper, the evolution of ion beam synthesized Co and Ge nanoclusters into a SiO2 matrix during annealing processes has been investigated by X-ray diffraction and transmission electron microscopy.
References
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Book
The stopping and range of ions in solids
J.P. Biersack,James F. Ziegler +1 more
TL;DR: A review of existing widely-cited tables of ion stopping and ranges can be found in this paper, where a brief exposition of what can be determined by modern calculations is given.
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Practical Surface Analysis
David Briggs,Martin P. Seah +1 more
TL;DR: In this paper, the authors used the carbon C 1s peak at 285 eV as a reference for charge correction in XPS analyses of samples prepared outside the high vacuum chamber relatively thick carbon layers are formed on the surfaces.
Journal ArticleDOI
Surface oxidation states of germanium
TL;DR: In this article, high resolution Ge 3D photoelectron spectra obtained with synchrotron radiation are used to determine the surface oxidation states of Ge(100) and Ge(111) surfaces.
Journal ArticleDOI
Precipitation, ripening and chemical effects during annealing of Ge+ implanted SiO2 layers
TL;DR: In this paper, annealing in N 2 or Ar leads to a dramatic change of the as-implanted Gaussian-like Ge depth distribution to a bimodal profile and an accumulation of Ge at the Si/SiO 2 interface.
Journal ArticleDOI
Application of XPS and factor analysis for non-conducting materials
Steffen Oswald,Stefan Baunack +1 more
TL;DR: In this article, the use of factor analysis in x-ray photoelectron spectroscopy and the correction of the charging effect are discussed, considering the aspects of background subtraction and spectra concatenation.
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