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Journal ArticleDOI

P‐1.5: Fabrication of Self‐Aligned Top‐Gate Amorphous InGaZnO Thin‐Film Transistors with Submicron Channel Length

Yunkai Cao, +2 more
- Vol. 50, pp 650-653
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The article was published on 2019-10-04. It has received 1 citations till now. The article focuses on the topics: Amorphous solid & Thin-film transistor.

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Citations
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Journal ArticleDOI

Self-Assembled Nanodielectrics for Solution-Processed Top-Gate Amorphous IGZO Thin-Film Transistors.

TL;DR: A metal oxide semiconductors such as amorphous indium gallium zinc oxide (a-IGZO) have made impressive strides as alternatives to amorphus silicon for electronics applications as mentioned in this paper.
References
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Journal ArticleDOI

Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

TL;DR: A novel semiconducting material is proposed—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs), which are fabricated on polyethylene terephthalate sheets and exhibit saturation mobilities and device characteristics are stable during repetitive bending of the TTFT sheet.
Journal ArticleDOI

Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances

TL;DR: The recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed andp-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed.
Proceedings ArticleDOI

180nm gate length amorphous InGaZnO thin film transistor for high density image sensor applications

TL;DR: In this paper, a novel hybrid complementary metal oxide semiconductor (CMOS) image sensor architecture utilizing nanometer scale amorphous In-Ga-Zn-O (a-IGZO) thin film transistors (TFT) combined with a conventional Si photo diode was proposed.
Journal ArticleDOI

Short Channel Characteristics of Gallium–Indium–Zinc–Oxide Thin Film Transistors for Three-Dimensional Stacking Memory

TL;DR: Amorphous gallium-indium-zincoxide (GIZO) thin film transistors with short channels of 50 nm were successfully fabricated by e-beam lithographic patterning as discussed by the authors.
Proceedings Article

A novel BEOL transistor (BETr) with InGaZnO embedded in Cu-interconnects for on-chip high voltage I/Os in standard CMOS LSIs

TL;DR: In this paper, a novel BEOL transistor (BETr) is developed in Cu interconnects with wide band-gap InGaZnO (IGZO) film for on-chip high voltage I/Os in standard CMOS LSIs only by one additional mask.
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