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Carl V. Thompson
Researcher at Massachusetts Institute of Technology
Publications - 422
Citations - 22680
Carl V. Thompson is an academic researcher from Massachusetts Institute of Technology. The author has contributed to research in topics: Thin film & Grain growth. The author has an hindex of 77, co-authored 416 publications receiving 21156 citations. Previous affiliations of Carl V. Thompson include Max Planck Society & Harvard University.
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Surface‐energy‐driven secondary grain growth in thin Au films
TL;DR: Secondary grain growth in thin Au films on SiO2 substrates is reported in this article, which indicates that surface energy anisotropy provides selectivity in the driving force for growth of secondary grains.
Journal Article
Crystal nucleation in amorphous (Au/100-y/Cu/y/)77Si9Ge14 alloys
TL;DR: In this paper, an isothermal calorimetric analysis of devitrification kinetics of melt-spun alloys of the series (Au/100y/Cu/y/)77Si9Ge14 is presented.
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Experimental and Computational Analysis of the Solvent-Dependent O2/Li(+)-O2(-) Redox Couple: Standard Potentials, Coupling Strength, and Implications for Lithium-Oxygen Batteries.
David G. Kwabi,Vyacheslav S. Bryantsev,Thomas P. Batcho,Daniil M. Itkis,Carl V. Thompson,Yang Shao-Horn +5 more
TL;DR: The results highlight the importance of the interplay between ion-solvent and ion-ion interactions for manipulating the energetics of intermediate species produced in aprotic metal-oxygen batteries.
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Reversible stress relaxation during precoalescence interruptions of volmer-weber thin film growth.
Cody Friesen,Carl V. Thompson +1 more
TL;DR: From in situ stress measurements, it is observed that a large component of the precoalescence compressive stress that develops during Volmer-Weber growth of polycrystalline Cu films relaxes reversibly, similar to the reversible stress relaxation previously observed in the post coalescence regime.
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Reaction kinetics of nickel/silicon multilayer films
TL;DR: In this article, the authors used differential scanning calorimetry to study the temperatures and kinetics of nickel silicide formation from nickel/amorphous silicon multilayer films.