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Yosuke Shimura

Researcher at Katholieke Universiteit Leuven

Publications -  75
Citations -  1697

Yosuke Shimura is an academic researcher from Katholieke Universiteit Leuven. The author has contributed to research in topics: Chemistry & Epitaxy. The author has an hindex of 19, co-authored 67 publications receiving 1527 citations. Previous affiliations of Yosuke Shimura include Japan Society for the Promotion of Science & Nagoya University.

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GeSn/Ge heterostructure short-wave infrared photodetectors on silicon

TL;DR: This work demonstrates that GeSn/Ge heterostructures can be used to developed SOI waveguide integrated photodetectors for short-wave infrared applications.
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Germanium-on-Silicon Mid-Infrared Arrayed Waveguide Grating Multiplexers

TL;DR: In this paper, the use of a germanium-on-silicon waveguide platform to realize an arrayed waveguide grating (AWG) operating in the 5 μm wavelength range, which can be used as a wavelength multiplexer for mid-infrared (midIR) light engines or as the core element of a midIR spectrometer, is described.
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Silicon-Based Photonic Integration Beyond the Telecommunication Wavelength Range

TL;DR: In this paper, a silicon-based photonic integrated circuit technology for applications beyond the telecommunication wavelength range is discussed, where the strong nonlinearity of silicon combined with the low nonlinear absorption in the mid-infrared is exploited to generate picosecond pulse based supercontinuum sources, optical parametric oscillators and wavelength translators connecting the tele communication wavelength range and the midinfrared.
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Growth of highly strain-relaxed Ge1−xSnx/virtual Ge by a Sn precipitation controlled compositionally step-graded method

TL;DR: In this article, a critical misfit strain control the onset of Sn precipitation at a given thickness of the Ge1−xSnx layer on virtual Ge substrates (v-Ge).
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Characterization of GeSn materials for future Ge pMOSFETs source/drain stressors

TL;DR: In this article, the compatibility of GeSn materials with source/drain engineering processes (B implantation and activation and NiGeSn formation) has been studied, and a low thermal budget has been determined for those processes on GeSn alloys.