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A self-consistent analysis of temperature-dependent field-effect measurements in hydrogenated amorphous-silicon thin-film transistors

Ruud E. I. Schropp, +2 more
- 15 Jul 1986 - 
- Vol. 60, Iss: 2, pp 643-649
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TLDR
In this paper, a self-consistent analysis of the density of gap states profile is presented, where the Meyer-Neldel (MN) rule is properly considered in relation to the nonuniform shift of the Fermi level as induced by the field effect.
Abstract
We calculated a more accurate density of states (DOS) profile from field‐effect (FE) measurements in hydrogenated amorphous silicon thin‐film transistors, taking into account the anomalously changing conductivity prefactor in accordance with the Meyer–Neldel (MN) rule. We present a self‐consistent analysis of the density of gap states profile, where the MN rule is, for the first time, properly considered in relation to the nonuniform shift of the Fermi level as induced by the field effect. Moreover, the calculation yields the correct flat‐band voltage and the corresponding flat‐band activation energy. The determination of conductivity activation energies free from any initial band bending effects is of importance in all types of transport measurements.

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Journal ArticleDOI

The physics of amorphous-silicon thin-film transistors

TL;DR: In this paper, the basic physics underlying the operation and key performance issues of amorphous-silicon thin-film transistors are discussed, and the transistors also show longer time threshold voltage shifts due to two distinct mechanisms: charge trapping in the silicon nitride gate insulator and metastable dangling bond state creation.
Journal ArticleDOI

Density of States of a-InGaZnO From Temperature-Dependent Field-Effect Studies

TL;DR: In this article, the effect of temperature on the TFT electrical properties was studied and the density of localized gap states was calculated by using a self-consistent method based on the experimentally obtained E a. The result shows good agreement with the DOS distribution calculated from SPICE simulations.
Journal ArticleDOI

Hydrogen Bistability as the Origin of Photo-Bias-Thermal Instabilities in Amorphous Oxide Semiconductors

TL;DR: In this article, the effects of the gate bias and light stress on the resulting a-IZTO fi eld effect transistors were examined in detail, and it was shown that hydrogen impurities including interstitial H and substitutional H can be bistable centers with an electronic deep-to-shallow transition through large lattice relaxation.
Journal ArticleDOI

The Effect of Density-of-State on the Temperature and Gate Bias-Induced Instability of InGaZnO Thin Film Transistors

TL;DR: In this article, the impact of gate insulator (GI) material on the device instability of InGaZnO (IGZO) thin film transistors (TFTs) was investigated.
Journal ArticleDOI

Generalized transport-band field-effect mobility in disordered organic and inorganic semiconductors

TL;DR: In this paper, the authors presented an effective mobility mu(eff) description at a reference carrier concentration, which separates the physical conductivity-concentration dependence from the device and bias attributes, enabling comparison of carrier transport in disordered semiconductors.
References
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Book

Electronic processes in non-crystalline materials

TL;DR: The Fermi Glass and the Anderson Transition as discussed by the authorsermi glass and Anderson transition have been studied in the context of non-crystalline Semiconductors, such as tetrahedrally-bonded semiconductors.
Journal ArticleDOI

Reversible conductivity changes in discharge‐produced amorphous Si

TL;DR: In this paper, a new reversible photoelectronic effect was reported for amorphous Si produced by glow discharge of SiH4, where long exposure to light decreases both the photoconductivity and the dark conductivity.
Journal ArticleDOI

Electronic properties of substitutionally doped amorphous Si and Ge

TL;DR: In this paper, it was shown that substitutional doping of an amorphous semiconductor is possible and can provide control of the electronic properties over a wide range, which corresponds to a movement of the Fermi level of 1·2 eV.
Journal ArticleDOI

Optically induced conductivity changes in discharge‐produced hydrogenated amorphous silicon

TL;DR: In this article, the authors show that long exposure to light decreases the photoconductivity and dark conductivity of some samples of hydrogenated amorphous silicon (a•Si':'H). Annealing above ∼150°C reverses the process.
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