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Journal ArticleDOI

Annealing effects on the performances of Bismuth-doped Indium Zinc Oxide thin-film transistors

TLDR
In this paper, annealing effects on the characteristics of bismuth-doped indium zinc oxide (IZBO) thin films and the electrical properties of IZBO thin-film transistors (TFTs) were investigated.
Abstract
In this work, annealing effects on the characteristics of bismuth-doped indium zinc oxide (IZBO) thin films and the electrical properties of IZBO thin-film transistors (TFTs) were investigated. The X-ray diffraction results reveal that all the IZBO thin films have an amorphous structure regardless of different annealing temperatures. In addition, all the a-IZBO thin films exhibit high transmittance in the visible light region. It is found that the annealing temperature has strong influences on the performances of a-IZBO TFTs. The devices annealed at 400 °C exhibit optimum performances with a field effect mobility of 25.4 cm2 V−1 s−1, a subthreshold swing of 0.22 V decade−1, a threshold voltage of −1.4 V and an on-to-off current ratio of 4.3 × 107. Stability of the devices under positive bias stress and negative bias stress were studied as well.

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Citations
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Journal ArticleDOI

Syntheses, structural evolution, electrical and optoelectronic characterization of ZnO/CuO composite films doped with transition metal Mn2+ ions

TL;DR: In this paper , the influence of manganese (Mn) as a transition metal on the morphological, structural, optical, electrical, and optoelectronic characteristics of nanostructured ZnO/CuO films was evaluated.
Journal ArticleDOI

Silicon doping and N2 annealing effects on Zn3N2 thin film transistors

Kaiwen Li, +3 more
- 01 Jan 2022 - 
TL;DR: In this article , Si-doped Zn 3 N 2 (ZSN) thin-film transistors were fabricated by magnetron sputtering and annealed in N 2 ambient.
References
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Book

CRC Handbook of Chemistry and Physics

TL;DR: CRC handbook of chemistry and physics, CRC Handbook of Chemistry and Physics, CRC handbook as discussed by the authors, CRC Handbook for Chemistry and Physiology, CRC Handbook for Physics,
Journal ArticleDOI

Oxide Semiconductor Thin‐Film Transistors: A Review of Recent Advances

TL;DR: The recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed andp-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed.
Journal ArticleDOI

Metal oxides for optoelectronic applications

TL;DR: This Review surveys the uniqueness and universality of MOs versus other unconventional electronic materials in terms of materials chemistry and physics, electronic characteristics, thin-film fabrication strategies and selected applications in thin- film transistors, solar cells, diodes and memories.
Journal ArticleDOI

Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors

TL;DR: In this paper, the impact of the passivation layer on the stability of indium-gallium-zinc oxide (IGZO) thin film transistors was investigated, and the authors attributed the Vth instability to the interaction between the exposed IGZO backsurface and oxygen and/or water in the ambient atmosphere during the gate voltage stress.
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