Journal ArticleDOI
Atom lithography using light forces
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TLDR
In this article, the trajectories of atoms are manipulated by light forces that efficiently focus the atoms in a standing light field produced by a laser, and the predicted linewidth of the deposited structures is in the range of 10-20 nm.About:
This article is published in Microelectronic Engineering.The article was published on 1996-01-15. It has received 16 citations till now. The article focuses on the topics: Light field & Lithography.read more
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Fabrication and characterization of nanoresonating devices for mass detection
TL;DR: In this article, a novel fabrication process and preliminary characterization of a nanomechanical resonating device, which is to be used for mass detection, is reported. But the fabrication of the device is based on laser lithography on Al coated SiO2/p++Si/SiO 2/Si O2/Si structures followed by dry and wet etching.
Journal ArticleDOI
Monolithic integration of mass sensing nano-cantilevers with CMOS circuitry
Zachary James Davis,Gabriel Abadal,Bjarne Helbo,Ole Hansen,Francesca Campabadal,Francesc Pérez-Murano,Jaume Esteve,Eduard Figueras,Jaume Verd,Nuria Barniol,Anja Boisen +10 more
TL;DR: In this paper, a fabrication method for nanometer-sized cantilevers with electrostatic excitation and integrated capacitive readout is introduced, which can increase both the mass and spatial resolution of a resonating cantilever-based mass sensor.
Journal ArticleDOI
Atom focusing by far-detuned and resonant standing wave fields: Thin-lens regime
TL;DR: In this article, the focusing of atoms after interacting with both far-detuned and resonant standing wave fields in the thin-lens regime is considered, and exact quantum expressions for the Fourier components of the density (that include all spherical aberration) are used to study the focusing numerically.
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Coherent Control in Nanolithography: Rydberg Atoms †
TL;DR: In this article, a coherent control for the optical manipulation of deposition patterns in nanofabrication with neutral atomic beams is described, which is then applied to the deposition of rubidium Rydberg atoms on surfaces.
References
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Journal ArticleDOI
Laser-Focused Atomic Deposition
TL;DR: The ability to fabricate nanometer-sized structures that are stable in air has the potential to contribute significantly to the advancement of new nanotechnologies and the understanding of nanoscale systems.
Journal ArticleDOI
Using light as a lens for submicron, neutral-atom lithography.
Gregory Timp,R. E. Behringer,Donald M. Tennant,J. E. Cunningham,Mara Prentiss,Karl K. Berggren +5 more
TL;DR: This work has used an optical standing wave at 589 nm as an array of cylindrical lenses to focus a perpendicular sodium beam into a grating on a substrate, with a periodicity of 294.3±0.3 nm.
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Microlithography By Using Neutral Metastable Atoms and Self-Assembled Monolayers
Karl K. Berggren,A Bard,James L. Wilbur,John D. Gillaspy,Andreas G. Helg,Jabez J. McClelland,Steven L. Rolston,William D. Phillips,Mara Prentiss,George M. Whitesides +9 more
TL;DR: In this paper, an estimated exposure of a SAM of dodecanethiolate (DDT) to 15 to 20 metastable argon atoms per DDT molecule damaged the SAM sufficiently to allow penetration of an aqueous solution of ferricyanide to the surface of the gold.