Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography

TLDR: In this paper, the authors report advances in nano-print lithography, its application in nanogap metal contacts, and related fabrication yield, and demonstrate 5nm linewidth and 14nm linepitch in resist using nanoimprint at room temperature with a pressure less than 15psi.

Abstract: We report advances in nanoimprint lithography, its application in nanogap metal contacts, and related fabrication yield. We have demonstrated 5nm linewidth and 14nm linepitch in resist using nanoimprint lithography at room temperature with a pressure less than 15psi. We fabricated gold contacts (for the application of single macromolecule devices) with 5nm separation by nanoimprint in resist and lift-off of metal. Finally, the uniformity and manufacturability of nanoimprint over a 4in. wafer were demonstrated.