Patent
Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method
TLDR
An immersion exposure process-use resist protection film forming material formed on a resist film, the material having characteristics of being transparent to an exposure light, having practically no miscibility with an immersion exposure-use liquid and causing no mixing with the resist film as discussed by the authors.Abstract:
An immersion exposure process-use resist protection film forming material formed on a resist film, the material having characteristics of being transparent to an exposure light, having practically no miscibility with an immersion exposure-use liquid and causing no mixing with the resist film; a protection film formed by this material; a composite film having the resist film; and a resist pattern forming method using them. These can prevent the degeneration of a resist film during immersion exposing and the degeneration of a liquid being used at the same time, and can form a high-resolution resist pattern using immersion exposing.read more
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Patent
Substrate Processing Apparatus
TL;DR: In this article, a bypass pipe is connected between the mechanical booster pump and the rest vacuum pumps located at a downstream side of the booster pump to prevent the exhaust gas from diffusing back to the inside of a process chamber.
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Positive resist composition and pattern-forming method using the same
TL;DR: In this article, the authors defined a positive resist composition comprising at least one compound selected from a compound capable of generating an acid represented by the formula (I) as defined herein upon irradiation with actinic rays or radiation.
Patent
Lithographic apparatus, and device manufacturing method
Maarten Marinus Johannes Wilhelmus Van Herpen,Vadim Yevgenyevich Banine,Johannes Peterus Henricus De Kuster,Johannes Hubertus Josephina Moors,Lucas Henricus Johannes Stevens,Bastiaan Theodoor Wolschrijn,Yurii Victorovitch Sidelnikov,Marc Hubertus Lorenz Van Der Velden,Wouter Anthon Soer,Thomas Stein,K Kurt Gielissen +10 more
TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
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Method for Manufacturing Semiconductor Device
TL;DR: In this article, the authors proposed a method for manufacturing a semiconductor device, in which the number of photolithography steps can be reduced, the manufacturing process can be simplified, and manufacturing can be performed with high yield at low cost.
Patent
Pattern formation method
Masayuki Endo,Masaru Sasago +1 more
TL;DR: In this article, a resist pattern is formed by selectively irradiating the resist film with exposing light while supplying water onto the resist pattern, and the pattern is developed so as to form resist pattern.
References
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Patent
Projection exposure method and system
Yoshio Fukami,Nobutaka Magome +1 more
TL;DR: In this paper, a projection exposure method capable of keeping a liquid (7) filled between a projection optical system (PL) and a wafer (W) even while the wafer is being moved when a liquid immersion method is used to conduct an exposure, wherein a discharge nozzle (21a) and inflow nozzles (23a, 23b) are disposed so as to hold a lens (4) at the tip end of the projection optical systems (PL), in an X direction.
Journal ArticleDOI
Immersion lithography at 157 nm
M. Switkes,M. Rothschild +1 more
TL;DR: In this article, the feasibility of immersion lithography at 157 nm for patterning below 70 nm was investigated and it was shown that this technology can enable an enhancement in resolution of ∼40% without radical changes in lasers, optics, or resist technology.
Patent
Device manufacturing method and a substrate
TL;DR: In this article, a method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus was proposed, in which a top coating was applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate.
Patent
Photosensitive element comprising photopolymerizable layer and protective layer
TL;DR: In this paper, the authors describe a photo-sensitive element comprising of a support, a lid, and a layer of photo-ensitive materials, having a thickness of about 0.5 to 20 micrometers.
Patent
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
TL;DR: In this paper, a process for imaging a photoresist with a (top) barrier coat to prevent contamination of the photoresists from environmental contaminants is described, and a barrier coating composition comprising a polymer with at least one ionizable group having a pKa ranging from about -9 to about 11.
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