Journal ArticleDOI
Normal‐incidence strained‐layer superlattice Ge0.5Si0.5/Si photodiodes near 1.3 μm
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TLDR
In this article, a strain-layer pin photodiodes, in which multiple strained layers serve as the absorption region, have been fabricated, which exhibit an optical response at wavelengths beyond 1.3 μm at normal incidence.Abstract:
Ge0.5Si0.5 strained‐layer pin photodiodes, in which multiple strained layers serve as the absorption region, have been fabricated. These devices exhibit an optical response at wavelengths beyond 1.3 μm at normal incidence. The measured external quantum efficiencies at an applied bias of 4 V are 17% at 0.85 μm and 1% at 1.3 μm, respectively. Excellent electrical characteristics evidenced by the avalanche breakdown at 20 V have also been demonstrated.read more
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Journal ArticleDOI
Silicon Modulators and Germanium Photodetectors on SOI: Monolithic Integration, Compatibility, and Performance Optimization
Tsung-Yang Liow,Kah-Wee Ang,Qing Fang,Junfeng Song,Yong-Zhong Xiong,Mingbin Yu,Guo-Qiang Lo,Dim-Lee Kwong +7 more
TL;DR: In this paper, a low-thermal-budget postepitaxy anneal was introduced to improve the performance of the Ge photodetectors, thus resulting in significantly improved dark current.
Journal ArticleDOI
Metal–semiconductor–metal near-infrared light detector based on epitaxial Ge/Si
Lorenzo Colace,Gianlorenzo Masini,F. Galluzzi,Gaetano Assanto,Giovanni Capellini,L. Di Gaspare,Elia Palange,Florestano Evangelisti +7 more
TL;DR: In this paper, a metal-semiconductor-metal photodetector based on relaxed Ge layers, epitaxially grown on silicon after insertion of a low-temperature-grown Ge buffer layer, was presented.
Journal ArticleDOI
Germanium-on-SOI Infrared Detectors for Integrated Photonic Applications
TL;DR: In this article, an overview of recent results on high-speed germanium-on-silicon-oninsulator (Geon-SOI) photodetectors and their prospects for integrated optical interconnect applications are presented.
Journal ArticleDOI
High-performance p-i-n Ge on Si photodetectors for the near infrared: from model to demonstration
TL;DR: In this paper, the authors investigated the integration of Ge p-i-n and n-i p heterojunction photodiodes on Si and designed and fabricated high-performance n-Ip Ge photododes on p/sup +/-Si substrates.
Journal ArticleDOI
Ge-on-Si approaches to the detection of near-infrared light
TL;DR: In this paper, metal-semiconductor-metal photodetectors based on epitaxial pure-Ge grown on silicon by chemical vapor deposition were designed and tested.