Journal ArticleDOI
Resolution enhanced proximity printing by phase and amplitude modulating masks
Sven Bühling,Frank Wyrowski,Ernst-Bernhard Kley,A J M Nellissen,Lingli Wang,Maarten Dirkzwager +5 more
TLDR
In this article, the amplitude and phase modulation of the illumination wave is exploited to improve the resolution of the photomask by replacing it with a mask causing both amplitude and amplitude modulation.Abstract:
Photolithography based on proximity printing offers a high throughput and cost effective patterning technology for production of, for instance, large area liquid crystal displays. The resolution of this technique is limited due to wave-optical effects in the proximity gap between the binary amplitude mask and the substrate. We can improve the resolution drastically by replacing the conventional photomask with a mask causing both amplitude and phase modulation of the illumination wave. We describe a wave-optical design procedure for such masks. The feasibility of the method is demonstrated by results from computer simulations and practical experiments. We show that, for a 50 µm gap, a 3 µm line/space pattern is resolved clearly for visible light illumination, whereas under conventional conditions the image is completely degraded. The proximity mask used in our experiments was fabricated by e-beam lithography with four height levels and two amplitude transmission values.read more
Citations
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Journal ArticleDOI
Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks
TL;DR: The application of the phase-shift method allows a significant resolution enhancement for proximity lithography in mask aligners and a diffractive photomask design for an elbow pattern having a half-pitch was developed with an iterative design algorithm.
Journal ArticleDOI
High-resolution proximity lithography for nano-optical components
Lorenz Stuerzebecher,Frank Fuchs,Uwe D. Zeitner,Uwe D. Zeitner,Andreas Tuennermann,Andreas Tuennermann +5 more
TL;DR: A comprehensive overview of resolution enhancement techniques and technical innovations in mask aligner lithography, especially the fabrication of periodic structures for nano-optical components, is provided in this paper, where a comparative discussion of the different techniques is provided.
Journal ArticleDOI
Phase contrast, phase retrieval and aberration balancing in shift-invariant linear imaging systems
TL;DR: This work treats the problems of phase-contrast image formation, deterministic phase retrieval and aberration balancing, in the imaging of weak objects using two-dimensional shift-invariant linear imaging systems and discusses how coherent and incoherent aberrations may be “balanced” against one another.
Patent
Exposure apparatus and methods
Peter A. Ivey,Richard Peter Mcwilliam,Alan Purvis,Gavin L. Williams,N.L. Seed,Richard Ian Curry,Jose Juan De Jesus Toriz-Garcia +6 more
TL;DR: In this article, a digital holography (DH) surface profilometery performed by a DH microscope is used to provide geometrical or topographical input to the CGH calculation routines.
Proceedings ArticleDOI
Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
TL;DR: In this paper, a mask aligner was used to generate an aerial image of a submicron period grating with high resolution and exceptional light efficiency at certain distances behind the mask.
References
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Journal ArticleDOI
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Joseph W. Goodman,Mary E. Cox +1 more
TL;DR: The second edition of this respected text considerably expands the original and reflects the tremendous advances made in the discipline since 1968 as discussed by the authors, with a special emphasis on applications to diffraction, imaging, optical data processing, and holography.
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Introduction to Fourier optics
TL;DR: The second edition of this respected text considerably expands the original and reflects the tremendous advances made in the discipline since 1968 as discussed by the authors, with a special emphasis on applications to diffraction, imaging, optical data processing, and holography.
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Optical Coherence and Quantum Optics
Leonard Mandel,Emil Wolf +1 more
TL;DR: In this article, the authors present a systematic account of optical coherence theory within the framework of classical optics, as applied to such topics as radiation from sources of different states of coherence, foundations of radiometry, effects of source coherence on the spectra of radiated fields, and scattering of partially coherent light by random media.
Journal ArticleDOI
Phase retrieval algorithms: a comparison.
TL;DR: Iterative algorithms for phase retrieval from intensity data are compared to gradient search methods and it is shown that both the error-reduction algorithm for the problem of a single intensity measurement and the Gerchberg-Saxton algorithm forThe problem of two intensity measurements converge.
Journal Article
A practical algorithm for the determination of phase from image and diffraction plane pictures
TL;DR: In this article, an algorithm is presented for the rapid solution of the phase of the complete wave function whose intensity in the diffraction and imaging planes of an imaging system are known.