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Room temperature crystallization by RF plasma

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TLDR
In this paper, the crystallization of amorphous thin films was achieved by radiofrequency (RF) plasma treatment, and the obtained films indicate almost the same photocatalytic activities as that of thermally crystallized TiO 2 films.
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This article is published in Thin Solid Films.The article was published on 2008-05-30. It has received 11 citations till now. The article focuses on the topics: Carbon film & Amorphous solid.

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Citations
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Wettability of ceramic surfaces -A wide range control of surface wettability from super hydrophilicity to super hydrophobicity, from static wettability to dynamic wettability

TL;DR: In this article, the surface wettability of a metal oxide can be controlled from super-hydrophilic state to superhydrophobic state by optimizing photo-induced surface reaction, nanometer scale roughness, and nanometer-scale physical and chemical heterogeneity.
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Characteristics of ITO films with oxygen plasma treatment for thin film solar cell applications

TL;DR: In this article, the effect of oxygen plasma treatment on the electro-optical and structural properties of indium-tinoxide films deposited by radio frequency magnetron sputtering method was investigated.
Journal ArticleDOI

Influence of different plasma treatments on electrical and optical properties on sputtered AZO and ITO films

TL;DR: In this paper, the influence of hydrogen and argon plasma treatment on the electro-optical and structural properties of aluminum-doped zinc oxide (AZO) and indium tin oxide (ITO) films were studied.
Journal ArticleDOI

Room-temperature crystallization of amorphous films by RF plasma treatment

TL;DR: In this article, a 13.56 MHz RF (radio frequency) plasma treatment was used for the crystallization of amorphous thin films of various materials, independently of the film preparation method and substrate materials.
Journal ArticleDOI

Inducing Crystallinity of Metal Thin Films with Weak Magnetic Fields without Thermal Annealing

TL;DR: In this article, a 0.4 Tesla magnetic field was used to replace the annealing of thin films to replace higher crystallinity demands higher temperatures, making the process inadequate for energy-efficient and environmentally friendly thin film fabrication.
References
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Book

The stopping and range of ions in solids

TL;DR: A review of existing widely-cited tables of ion stopping and ranges can be found in this paper, where a brief exposition of what can be determined by modern calculations is given.
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Imprint of sub-25 nm vias and trenches in polymers

TL;DR: In this article, a nanoimprint process that presses a mold into a thin thermoplastic polymer film on a substrate to create vias and trenches with a minimum size of 25 nm and a depth of 100 nm has been demonstrated.
Journal ArticleDOI

Mold‐assisted nanolithography: A process for reliable pattern replication

TL;DR: In this paper, a process for reproducibly and reliably realizing thin-layer patterning having details with dimensions of 100 nm or even less is described, which is called mold lithography, and the strengths of this process are its simplicity and low cost while maintaining compatibility with (standard) semiconductor technology processing.
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High-temperature microwave processing of materials

TL;DR: In this paper, the physical aspects of a cross-disciplinary science and technology field: the microwave processing of materials are reviewed, including the absorption of electromagnetic waves, heat transfer and the electrodynamics of single and multimode microwave cavities.
Journal ArticleDOI

Roller nanoimprint lithography

TL;DR: In this article, an alternative approach to flat nanoimprint lithography (NIL) is demonstrated, where a cylinder mold is placed on a flat, solid substrate and a smooth roller is applied on top of the mold.
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