Journal ArticleDOI
Spatial dependence of particle light scattering in an rf silane discharge
TLDR
In this article, a capacitively coupled, rf glow discharge of silane in argon was studied to determine the spatial dependence of particle light scattering, which is compatible with concepts of particle growth in sharp spatial zones near the plasma sheaths.Abstract:
A capacitively coupled, rf glow discharge of silane in argon was studied to determine the spatial dependence of particle light scattering. Light scattering from a pulsed laser at 500 nm shows sharp spatial peaks of scattered intensity near the electrodes. These scattering peaks are correlated with the plasma sheath edges because they exhibit spatial changes with discharge pressure characterized by a constant product of pressure and distance from the electrode. Light scattering at various silane mole fractions and gas flow rates is compatible with concepts of particle growth in sharp spatial zones near the plasma sheaths.read more
Citations
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Journal ArticleDOI
The 2012 Plasma Roadmap
Seiji Samukawa,Masaru Hori,Shahid Rauf,Kunihide Tachibana,Peter Bruggeman,Gerrit Kroesen,J. Christopher Whitehead,Anthony B. Murphy,Alexander Gutsol,Svetlana Starikovskaia,Uwe Kortshagen,Jean-Pierre Boeuf,Timothy John Sommerer,Mark J. Kushner,Uwe Czarnetzki,Nigel J. Mason +15 more
TL;DR: The 2012 plasma road map as mentioned in this paper provides guidance to the field by reviewing the major challenges of low-temperature plasma physics and their many sub-fields, as well as a review of the current state of the art in the field.
Journal ArticleDOI
Nonthermal Plasma Synthesis of Nanocrystals: Fundamental Principles, Materials, and Applications
Uwe Kortshagen,R. Mohan Sankaran,Rui N. Pereira,Rui N. Pereira,Steven L. Girshick,Jeslin J. Wu,Eray S. Aydil +6 more
TL;DR: The fundamentals of nanocrystal formation in plasmas are discussed, practical implementations of plasma reactors are reviewed, the materials that have been produced with nonthermal plAsmas and surface chemistries that have be developed are surveyed, and an overview of applications of plasma-synthesized nanocrystals is provided.
Journal ArticleDOI
Levitation of dust in rf and dc glow discharges
Abstract: We have examined the dynamics of dust in collisionless and collisional electrode sheaths of dc and rf glow discharges. The charge of the dust particles, the various forces, oscillation frequencies, damping effects and energy potential extrema are calculated. In the rf sheaths the dust particle charge is negative in the whole sheath, while in the dc sheaths the dust particle charge is positive in a major part of the sheath. Collection of dust leads to changes in the dust and plasma potentials and to a reduction in the maximum dust particle size that can be levitated. Close to the electrode there will be a dust-free zone.
Journal ArticleDOI
Particle Distributions and Laser-Particle Interactions in an RF Discharge of Silane
TL;DR: In this article, the positions between the plane-parallel electrodes were probed by pulsed laser light scattering at several wavelengths and the particle nucleation and growth kinetics were very well demonstrated over this range of discharge parameters.
Journal ArticleDOI
Fluid model simulations of a 13.56‐MHz rf discharge: Time and space dependence of rates of electron impact excitation
TL;DR: In this paper, a simulation of a 13.56MHz rf discharge was performed and the shape of the excitation rate waveform, its direction of propagation, time of occurrence in the rf period, and the initial increase in intensity followed by attenuation were all observed experimentally as well as in the simulation.
References
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Journal ArticleDOI
Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges
TL;DR: In this article, the electron properties in a parallel plate capacitively coupled rf discharge were studied with results from a Monte-Carlo simulation, and the dc component of the sheath potential was found to be a function of the ratio λ/d, where is the electron mean free path and d is the electrode spacing.
Journal ArticleDOI
Radical species in argon‐silane discharges
TL;DR: The principal radical seen at the substrate surface of a dc proximity discharge is SiH3 as mentioned in this paper, which is the most common radical seen in dc proximity discharges, and it has been measured by low energy, electroncollisional ionization and mass spectrometer detection of SiH+n.
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Ion dynamics of rf plasmas and plasma sheaths: A time‐resolved spectroscopic study
TL;DR: In this paper, a new plasma diagnostic technique, time-resolved laser-induced fluorescence (TRLIF) spectroscopy, has been developed to monitor ion dynamics in rf glow discharges.
Journal ArticleDOI
Observation of HSiCl in a chemical vapor deposition reactor by laser‐excited fluorescence
Pauline Ho,William G. Breiland +1 more
TL;DR: In this article, free-radical HSiCl has been detected in the gas phase during the chemical vapor deposition of silicon from dichlorosilane and its role in the deposition process was investigated.
Journal ArticleDOI
Growth and defect chemistry of amorphous hydrogenated silicon
TL;DR: Magnetic resonance (NMR,EPR) and infrared studies are presented of amorphous hydrogenated silicon (a•Si:H) films prepared by homogeneous chemical vapor deposition (HOMOCVD) and rf plasma decomposition using silane and disilane as discussed by the authors.