Journal ArticleDOI
The role of copper in ZnO/Cu/ZnO thin films for flexible electronics
TLDR
In this paper, the Hall resistivity of the films was as low as 6.9×10−5 Ω-cm with a carrier concentration of 1.2×1022 cm−3 at the optimum copper layer thickness.Abstract:
ZnO/Cu/ZnO multilayer structures with very high conductivity have been obtained by magnetron sputtering. The Hall resistivity of the films was as low as 6.9×10−5 Ω-cm with a carrier concentration of 1.2×1022 cm−3 at the optimum copper layer thickness. The conduction mechanism has been explained in terms of metal to oxide carrier injection at low copper thickness and metal layer conduction at higher Cu thicknesses. The peak transmittance of the films is 88% and the photopic averaged transmittance is 75%. Optical transmission behavior of the films involves absorption by copper due to d-band to Fermi-surface transitions at short wavelengths and reflectance combined with scattering losses at long wavelengths. A Burstein–Moss shift in the band gap of the films is seen to take place with increase in thickness of the copper layer. The Haacke figure of merit has been calculated for the films with the best value being 8.7×10−3 Ω−1. Pole figure results reveal that the copper midlayer acts as a hindrance to (002) Zn...read more
Citations
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Journal ArticleDOI
Transparent heat regulating (THR) materials and coatings for energy saving window applications: Impact of materials design, micro-structural, and interface quality on the THR performance
Goutam Kumar Dalapati,Ajay Kushwaha,Mohit Sharma,Vignesh Suresh,Santiranjan Shannigrahi,Siarhei Zhuk,Siarhei Zhuk,Saeid Masudy-Panah,Saeid Masudy-Panah +8 more
TL;DR: In this article, the development of energy saving transparent heat regulating (THR) materials and coating for energy saving window applications has been discussed, and detailed analysis of growth of continuous and thin metal layer influence of the seed layer (germanium and nickel) and doping on the growth mechanism of thin metal have been discussed.
Journal ArticleDOI
High quality transparent TiO2/Ag/TiO2 composite electrode films deposited on flexible substrate at room temperature by sputtering
Aritra Dhar,Terry Alford +1 more
TL;DR: In this article, the effect of Ag thickness on optical and electrical properties and the mechanism of conduction have been discussed, and the critical thickness of Ag mid-layer to form a continuous conducting layer is 9.5 nm and the multilayer has been optimized to obtain a sheet resistance of 5.7 Ω/sq and an average optical transmittance of 90% at 590 nm.
Journal ArticleDOI
High-performance radiation stable ZnO/Ag/ZnO multilayer transparent conductive electrode
TL;DR: In this paper, the fabrication and performance of swift heavy ion (SHI) irradiated transparent conducting electrode (TCE) having oxide-metal-oxide multilayer structure; ZnO/Ag/ZnO (ZAZ) deposited at room temperature and exhibiting electrical and optical properties comparable to that of commercial ITO.
Journal ArticleDOI
Optimization of SnO2/Ag/SnO2 tri-layer films as transparent composite electrode with high figure of merit
TL;DR: In this article, the influence of Ag layer thickness and SnO 2 layer thickness on electrical and optical properties of the tri-layer films was investigated using Hall measurements, four-point probe and ultraviolet-visible-near infrared spectrophotometer.
Journal ArticleDOI
Influence of Ag thickness of aluminum-doped ZnO/Ag/aluminum-doped ZnO thin films
TL;DR: In this article, high conducting aluminum-doped ZnO (30,nm)/Ag (5,15,nm) multilayer thin films were deposited on glass substrate by rf magnetron sputtering and e-beam evaporation.
References
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