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Journal ArticleDOI

Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions

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TLDR
In this paper, Pinhole spatial filtering is employed to provide spatially coherent radiation at a power level determined by the wavelength, electron beam, and undulator parameters, achieving a power of 10 /spl mu/W in a relative spectral bandwidth of 9/spl times/10/sup -4/, with 1.90-GeV electrons traversing an 8-cm period undulator of 55 periods.
Abstract
Undulator radiation, generated by relativistic electrons traversing a periodic magnet structure, can provide a continuously tunable source of very bright and partially coherent radiation in the extreme ultraviolet (EUV), soft X-ray (SXR), and X-ray regions of the electromagnetic spectrum. Typically, 1-10 W are radiated within a 1/N relative spectral bandwidth, where N is of order 100. Monochromators are frequently used to narrow the spectral bandwidth and increase the longitudinal coherence length, albeit with a more than proportionate loss of power. Pinhole spatial filtering is employed to provide spatially coherent radiation at a power level determined by the wavelength, electron beam, and undulator parameters. In this paper, experiments are described in which broadly tunable, spatially coherent power is generated at EUV and soft X-ray wavelengths extending from about 3 to 16 nm (80-430-eV photon energies). Spatially coherent power of order 10 /spl mu/W is achieved in a relative spectral bandwidth of 9/spl times/10/sup -4/, with 1.90-GeV electrons traversing an 8-cm period undulator of 55 periods. This radiation has been used in 13.4-nm interferometric tests that achieve an rms wavefront error (departure from sphericity) of /spl lambda//sub euv//330. These techniques scale in a straightforward manner to shorter soft X-ray wavelengths using 4-5-cm period undulators at 1.90 GeV and to X-ray wavelengths of order 0.1 nm using higher energy (6-8 GeV) electron beams at other facilities.

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Citations
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Journal ArticleDOI

Nanolithography with coherent extreme ultraviolet light

Harun H Solak
- 21 May 2006 - 
TL;DR: Extreme ultraviolet interference lithography (EUV-IL) is a newly developed technique for the production of periodic nano-structures with resolution below 20 nm as discussed by the authors, which is based on coherent radiation that is obtained from undulators at synchrotron radiation laboratories.
Journal ArticleDOI

Diagnostics for plasma-based electron accelerators

TL;DR: In this paper, a new generation of laboratory diagnostics is reviewed that yield snapshots, or even movies, of laser and particle-beam-generated plasma accelerator structures based on their phase modulation or deflection of femtosecond electromagnetic or electron probe pulses.
Journal ArticleDOI

Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy.

TL;DR: This report reports, for the first time to the authors' knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range using a spatially unfiltered incident beam to characterize a sensor.
Journal ArticleDOI

Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system

TL;DR: In this article, the authors describe various LSI implementations and demonstrate the use of a cross-grating, carrier-frequency configuration to characterize a large-field 4×-reduction EUV lithography optic.
Journal ArticleDOI

Spatial coherence characterization of undulator radiation

TL;DR: In this paper, the coherence properties of undulator radiation at extreme ultraviolet (EUV) wavelengths were measured using the Thompson-Wolf two-pinhole method and the effects of asymmetric source size and beamline apertures were observed.
References
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Book

Statistical Optics

Principles of Optics (7th Ed)

Max Born, +1 more
Journal ArticleDOI

On the possibilities of x-ray phase contrast microimaging by coherent high-energy synchrotron radiation

TL;DR: In this paper, a straightforward experimental setup for phase contrast imaging is proposed and used to record holographic images from organic samples of 10-100 pm at energy lo-50 keV with the contrast up to 50%-100%.
Book

X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

TL;DR: In this paper, the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation are discussed and their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy.
PatentDOI

Phase-shifting point diffraction interferometer

TL;DR: A novel interferometer design suitable for highly accurate measurement of wave-front aberrations over a wide range of wavelengths, from visible to x ray is described, applicable to at-wavelength testing of many optical systems, including short-wa wavelength projection lithography optics.
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