Journal ArticleDOI
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions
David Attwood,Patrick P. Naulleau,Kenneth A. Goldberg,Edita Tejnil,Chang Chang,R. Beguiristain,Phillip J. Batson,Jeffrey Bokor,Eric M. Gullikson,Masato Koike,Hector Medecki,James H. Underwood +11 more
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TLDR
In this paper, Pinhole spatial filtering is employed to provide spatially coherent radiation at a power level determined by the wavelength, electron beam, and undulator parameters, achieving a power of 10 /spl mu/W in a relative spectral bandwidth of 9/spl times/10/sup -4/, with 1.90-GeV electrons traversing an 8-cm period undulator of 55 periods.Abstract:
Undulator radiation, generated by relativistic electrons traversing a periodic magnet structure, can provide a continuously tunable source of very bright and partially coherent radiation in the extreme ultraviolet (EUV), soft X-ray (SXR), and X-ray regions of the electromagnetic spectrum. Typically, 1-10 W are radiated within a 1/N relative spectral bandwidth, where N is of order 100. Monochromators are frequently used to narrow the spectral bandwidth and increase the longitudinal coherence length, albeit with a more than proportionate loss of power. Pinhole spatial filtering is employed to provide spatially coherent radiation at a power level determined by the wavelength, electron beam, and undulator parameters. In this paper, experiments are described in which broadly tunable, spatially coherent power is generated at EUV and soft X-ray wavelengths extending from about 3 to 16 nm (80-430-eV photon energies). Spatially coherent power of order 10 /spl mu/W is achieved in a relative spectral bandwidth of 9/spl times/10/sup -4/, with 1.90-GeV electrons traversing an 8-cm period undulator of 55 periods. This radiation has been used in 13.4-nm interferometric tests that achieve an rms wavefront error (departure from sphericity) of /spl lambda//sub euv//330. These techniques scale in a straightforward manner to shorter soft X-ray wavelengths using 4-5-cm period undulators at 1.90 GeV and to X-ray wavelengths of order 0.1 nm using higher energy (6-8 GeV) electron beams at other facilities.read more
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Journal ArticleDOI
Nanolithography with coherent extreme ultraviolet light
TL;DR: Extreme ultraviolet interference lithography (EUV-IL) is a newly developed technique for the production of periodic nano-structures with resolution below 20 nm as discussed by the authors, which is based on coherent radiation that is obtained from undulators at synchrotron radiation laboratories.
Journal ArticleDOI
Diagnostics for plasma-based electron accelerators
TL;DR: In this paper, a new generation of laboratory diagnostics is reviewed that yield snapshots, or even movies, of laser and particle-beam-generated plasma accelerator structures based on their phase modulation or deflection of femtosecond electromagnetic or electron probe pulses.
Journal ArticleDOI
Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy.
Pascal Mercère,Philippe Zeitoun,Mourad Idir,Sébastien Le Pape,Denis Douillet,Xavier Levecq,Guillaume Dovillaire,Samuel Bucourt,Kenneth A. Goldberg,Patrick P. Naulleau,Senajith Rekawa +10 more
TL;DR: This report reports, for the first time to the authors' knowledge, experimental demonstration of wave-front analysis via the Hartmann technique in the extreme ultraviolet range using a spatially unfiltered incident beam to characterize a sensor.
Journal ArticleDOI
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system
TL;DR: In this article, the authors describe various LSI implementations and demonstrate the use of a cross-grating, carrier-frequency configuration to characterize a large-field 4×-reduction EUV lithography optic.
Journal ArticleDOI
Spatial coherence characterization of undulator radiation
TL;DR: In this paper, the coherence properties of undulator radiation at extreme ultraviolet (EUV) wavelengths were measured using the Thompson-Wolf two-pinhole method and the effects of asymmetric source size and beamline apertures were observed.
References
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Journal ArticleDOI
On the possibilities of x-ray phase contrast microimaging by coherent high-energy synchrotron radiation
TL;DR: In this paper, a straightforward experimental setup for phase contrast imaging is proposed and used to record holographic images from organic samples of 10-100 pm at energy lo-50 keV with the contrast up to 50%-100%.
Book
X-Rays and Extreme Ultraviolet Radiation: Principles and Applications
TL;DR: In this paper, the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation are discussed and their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy.
PatentDOI
Phase-shifting point diffraction interferometer
TL;DR: A novel interferometer design suitable for highly accurate measurement of wave-front aberrations over a wide range of wavelengths, from visible to x ray is described, applicable to at-wavelength testing of many optical systems, including short-wa wavelength projection lithography optics.