E
E. Sikorski
Researcher at IBM
Publications - 23
Citations - 977
E. Sikorski is an academic researcher from IBM. The author has contributed to research in topics: CMOS & Hybrid silicon laser. The author has an hindex of 12, co-authored 23 publications receiving 945 citations.
Papers
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Journal ArticleDOI
Self-aligned n-channel germanium MOSFETs with a thin Ge oxynitride gate dielectric and tungsten gate
Huiling Shang,Kam-Leung Lee,P. Kozlowski,Christopher P. D'Emic,I. Babich,E. Sikorski,Meikei Ieong,Hon-Sum Philip Wong,Kathryn W. Guarini,Wilfried Haensch +9 more
TL;DR: In this paper, self-aligned n-channel germanium (Ge) MOSFETs with a thin Ge oxynitride gate dielectric and tungsten gate electrode are presented.
Journal ArticleDOI
Process integration of self-assembled polymer templates into silicon nanofabrication
TL;DR: In this article, the processes used to achieve highly uniform nanoporous dielectric films, high-aspect-ratio nanotextured silicon, silicon nitride dot arrays, silicon pillar arrays, and silicon tip arrays are described.
Journal ArticleDOI
High-capacity, self-assembled metal-oxide-semiconductor decoupling capacitors
Charles T. Black,Kathryn W. Guarini,Ying Zhang,H. Kim,J. Benedict,E. Sikorski,Inna V. Babich,Keith Raymond Milkove +7 more
TL;DR: In this paper, the authors combine nanometer-scale polymer self assembly with advanced semiconductor microfabrication to produce metaloxide-semiconductor (MOS) capacitors with accumulation capacitance more than 400% higher than planar devices of the same lateral area.
Proceedings ArticleDOI
Polymer self assembly in semiconductor microelectronics
Charles T. Black,Kathryn W. Guarini,Ricardo Ruiz,E. Sikorski,Inna V. Babich,Robert L. Sandstrom,Y. Zhang +6 more
TL;DR: Black et al. as discussed by the authors integrated polymer self assembly with semiconductor processing to enable sub-lithographic patterning of integrated circuit (IC) device elements and offers a non-traditional pathway to performance improvements.
Proceedings ArticleDOI
FinFET performance advantage at 22nm: An AC perspective
Michael A. Guillorn,Josephine B. Chang,A. Bryant,Nicholas C. M. Fuller,Omer H. Dokumaci,X. Wang,J. Newbury,Katherina Babich,John A. Ott,Balasubramanian S. Pranatharthi Haran,R.R. Yu,Christian Lavoie,D. Klaus,Y. Zhang,E. Sikorski,W. Graham,B. To,Michael F. Lofaro,James A. Tornello,Dinesh Koli,Bin Yang,A. Pyzyna,D. Neumeyer,Marwan H. Khater,Atsushi Yagishita,H. Kawasaki,Wilfried Haensch +26 more
TL;DR: In this article, the authors estimate that superior electrostatics and reduced junction capacitance in FinFETs may provide a 13~23% reduction in delay relative to planar FETs.