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Irina Kärkkänen
Publications - 6
Citations - 162
Irina Kärkkänen is an academic researcher. The author has contributed to research in topics: Atomic layer deposition & Titanium. The author has an hindex of 6, co-authored 6 publications receiving 144 citations.
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Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”
Esko Ahvenniemi,Andrew R. Akbashev,Saima Ali,Mikhael Bechelany,Maria Berdova,Stefan Ivanov Boyadjiev,David Campbell Cameron,Rong Chen,Mikhail Chubarov,Véronique Cremers,Anjana Devi,Viktor Drozd,Liliya Elnikova,Gloria Gottardi,Kestutis Grigoras,Dennis M. Hausmann,Cheol Seong Hwang,Shih Hui Jen,Tanja Kallio,Jaana Kanervo,Ivan Khmelnitskiy,Dohan Kim,Lev Klibanov,Yury Koshtyal,A. Outi I. Krause,Jakob Kuhs,Irina Kärkkänen,Marja-Leena Kääriäinen,Tommi Kääriäinen,Luca Lamagna,Adam A. Łapicki,Markku Leskelä,Harri Lipsanen,Jussi Lyytinen,A. A. Malkov,A. A. Malygin,Abdelkader Mennad,Christian Militzer,Jyrki Molarius,Małgorzata Norek,Çaǧla Özgit-Akgün,Mikhail Panov,Henrik Pedersen,Fabien Piallat,Georgi Popov,Riikka L. Puurunen,Geert Rampelberg,Robin H. A. Ras,Erwan Rauwel,Fred Roozeboom,Fred Roozeboom,Timo Sajavaara,Hossein Salami,Hele Savin,Nathanaelle Schneider,Thomas E. Seidel,Jonas Sundqvist,Dmitry Suyatin,Tobias Törndahl,J. Ruud van Ommen,Claudia Wiemer,Oili Ylivaara,Oksana Yurkevich +62 more
TL;DR: The Virtual Project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of atomic layer deposition more transparent.
Journal ArticleDOI
Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
Chittaranjan Das,Karsten Henkel,Massimo Tallarida,Dieter Schmeißer,Hassan Gargouri,Irina Kärkkänen,Jessica Schneidewind,Bernd Gruska,Michael Arens +8 more
TL;DR: In this article, the influence of the ALD mode on functional parameters, by comparing the growth rate and electronic properties of TiO2 films deposited by thermal (T-) and plasma-enhanced (PE-) ALD, is verified.
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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
Malgorzata Sowinska,Karsten Henkel,Dieter Schmeißer,Irina Kärkkänen,Jessica Schneidewind,Franziska Naumann,Bernd Gruska,Hassan Gargouri +7 more
TL;DR: In this article, the impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titanium oxynitride (TiOxNy) films was studied.
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Analysis of nitrogen species in titanium oxynitride ALD films
Malgorzata Sowinska,Simone Brizzi,Chittaranjan Das,Irina Kärkkänen,Jessica Schneidewind,Franziska Naumann,Hassan Gargouri,Karsten Henkel,Dieter Schmeißer +8 more
TL;DR: In this paper, it was found that nitrogen atoms in these films are differently bonded and it can be distinguished between Ti ON and Ti N bonding configurations and molecular nitrogen species caused by precursor fragments.
Journal ArticleDOI
Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
Małgorzata Kot,Karsten Henkel,Chittaranjan Das,Simone Brizzi,Irina Kärkkänen,Jessica Schneidewind,Franziska Naumann,Hassan Gargouri,Dieter Schmeißer +8 more
TL;DR: In this article, a comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium (TDMAT) and N2 plasma as well as titanium(IV)isopropoxide and NH3 plasma is reported.