Véronique Cremers

TL;DR: In this paper, the authors present a review of the current status of knowledge about the conformality of ALD processes, including an overview of relevant gas transport regimes, definitions of exposure and sticking probability, and a distinction between different ALD growth types observed in high aspect ratio structures.

TL;DR: The Virtual Project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of atomic layer deposition more transparent.

TL;DR: In this paper, a poly-caprolactone (PCL) matrix is embedded in a polyamide polysilicon (PIL-101) matrix by means of electrospinning to create a "catalytic carpet" which is highly efficient and can be recovered within seconds after catalysis.

TL;DR: In this article, the authors compared deposition on an infinite array of holes versus an infinite arrays of pillars and found that a well-spaced pillar geometry requires a 2-30 times smaller precursor exposure than a hole geometry and is therefore more ALD friendly.

TL;DR: In this article, an inorganic TiO2 coating of pSi microparticles by atomic layer deposition (ALD) was used to stabilize the photoluminescence (PL) of the pSi particles in a biological buffer for more than three months without significant effect on their morphology.